Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching

被引：4

作者：

Atar, Gil ^{[1
,2
]}

Ternyak, Orna ^{[3
]}

Greental, Doron ^{[4
]}

Eger, David ^{[1
]}

Chechelnitsky, Galina ^{[4
]}

Mazurski, Noa

Gouta, Shifra ^{[1
]}

Elbaz, Yehoudit ^{[1
]}

Bruner, Ariel ^{[1
]}

Sfez, Bruno ^{[1
]}

Ruschin, Shlomo ^{[2
]}

机构：

[1] Soreq NRC, Div Appl Phys, IL-81800 Yavne, Israel

[2] Tel Aviv Univ, Fac Engn, Dept Elect Engn Phys Elect, IL-69978 Tel Aviv, Israel

[3] Technion Israel Inst Technol, Micro & Nanofabricat Unit, IL-32000 Haifa, Israel

[4] Hebrew Univ Jerusalem, Fac Sci, Ctr Nano Sci & Nanotechnol, IL-91904 Jerusalem, Israel

来源：

OPTICAL MATERIALS | 2014年 / 38卷

关键词：

Fused silica; Dry etching; Al doping; Waveguide; Rare-earth doped silica; LASER; GLASSES;

D O I：

10.1016/j.optmat.2014.10.048

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (similar to 20 x 20 gm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring similar to 1 dB/cm optical propagation loss. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：265 / 271

页数：7

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