Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups

被引:32
作者
Bertrand, Olivier [1 ]
Schumers, Jean-Marc [1 ]
Kuppan, Chandrasekar [1 ]
Marchand-Brynaert, Jacqueline [2 ]
Fustin, Charles-Andre [1 ]
Gohy, Jean-Francois [1 ]
机构
[1] Catholic Univ Louvain, IMCN, Bio & Soft Matter BSMA, B-1348 Louvain, Belgium
[2] Catholic Univ Louvain, IMCN, Mol Solids & React MOST, B-1348 Louvain, Belgium
关键词
DIBLOCK COPOLYMERS; POLYMERIC MICELLES; PHOTOLYSIS; VESICLES; RELEASE; DESIGN;
D O I
10.1039/c1sm05631j
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The synthesis of photocleavable poly(dimethoxynitrobenzyl acrylate)-block-polystyrene block copolymers is described. The UV irradiation of these block copolymers, dissolved in a good solvent for both blocks, selectively cleaves the dimethoxynitrobenzyl protecting groups, leading to carboxylic acid moieties. Since the resulting hydrophilic poly(acrylic acid) block is insoluble in the solvent used, self-assembly of the diblocks into micelles is observed. This light-induced micellization process is further used to trap dyes into the core of the micelles.
引用
收藏
页码:6891 / 6896
页数:6
相关论文
共 43 条
[1]   o-Nitrobenzyl photolabile protecting groups with red-shifted absorption:: Syntheses and uncaging cross-sections for one- and two-photon excitation [J].
Aujard, Isabelle ;
Benbrahim, Chouaha ;
Gouget, Marine ;
Ruel, Odile ;
Baudin, Jean-Bernard ;
Neveu, Pierre ;
Jullien, Ludovic .
CHEMISTRY-A EUROPEAN JOURNAL, 2006, 12 (26) :6865-6879
[2]   Decoration of shell cross-linked reverse polymer micelles using ATRP: A new route to stimuli-responsive nanoparticles [J].
Babin, Jerome ;
Lepage, Martin ;
Zhao, Yue .
MACROMOLECULES, 2008, 41 (04) :1246-1253
[3]   A New Two-Photon-Sensitive Block Copolymer Nanocarrier [J].
Babin, Jerome ;
Pelletier, Maxime ;
Lepage, Martin ;
Allard, Jean-Francois ;
Morris, Denis ;
Zhao, Yue .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2009, 48 (18) :3329-3332
[4]   Photolabile protecting groups and linkers [J].
Bochet, CG .
JOURNAL OF THE CHEMICAL SOCIETY-PERKIN TRANSACTIONS 1, 2002, (02) :125-142
[5]   Synthesis of Photocleavable Amphiphilic Block Copolymers: Toward the Design of Photosensitive Nanocarriers [J].
Cabane, Etienne ;
Malinova, Violeta ;
Meier, Wolfgang .
MACROMOLECULAR CHEMISTRY AND PHYSICS, 2010, 211 (17) :1847-1856
[6]   Thermo- and photo-responsive polymeric systems [J].
Dai, Sheng ;
Ravi, Palaniswamy ;
Tam, Kam Chiu .
SOFT MATTER, 2009, 5 (13) :2513-2533
[7]   UV and Near-IR Triggered Release from Polymeric Nanoparticles [J].
Fomina, Nadezda ;
McFearin, Cathryn ;
Sermsakdi, Marleen ;
Edigin, Osayimwense ;
Almutairi, Adah .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2010, 132 (28) :9540-9542
[8]   Block copolymer micelles [J].
Gohy, JF .
BLOCK COPOLYMERS II, 2005, 190 :65-136
[9]   Synthesis and thin film characterization of poly(styrene-block-methyl methacrylate) containing an anthracene dimer photocleavable junction point [J].
Goldbach, JT ;
Russell, TP ;
Penelle, J .
MACROMOLECULES, 2002, 35 (11) :4271-4276
[10]   Fast Photodegradable Block Copolymer Micelles for Burst Release [J].
Han, Dehui ;
Tong, Xia ;
Zhao, Yue .
MACROMOLECULES, 2011, 44 (03) :437-439