SnO2-based Thin Film Gas Sensors with Functionalized Surface

At present, surface modification of the SnO2 by nanoclusters of both noble metals and transition metals is becoming one of the most promising methods which can be used for optimization of the operating characteristics of solid state gas sensors. The effectiveness of such approach for improvement both gas sensor sensitivity and selectivity of the SnO2-based devices has been discussed in Ref. [1]. For these purposes various methods of deposition were tested. One can find information about such methods as the co-precipitation process, pulsed laser deposition, spray reaction, sputtering, UV photolysis, and impregnation. In present research we estimated the opportunity of the successive ionic layer deposition (SILD) method for mentioned above purpose.