Negative electron affinity surfaces of aluminum nitride and diamond

被引:85
作者
Nemanich, RJ [1 ]
Baumann, PK [1 ]
Benjamin, MC [1 ]
King, SW [1 ]
vanderWeide, J [1 ]
Davis, RF [1 ]
机构
[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695
关键词
electron affinity; nitrides; electron emission; surfaces;
D O I
10.1016/0925-9635(95)00485-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electron affinity of diamond and AlGaN surfaces are studied by UV photoemission spectroscopy. It is shown that H terminated diamond surfaces exhibit a negative electron affinity while oxide terminated surfaces exhibit a positive electron affinity. In addition, thin metal layers can also induce a NEA on both (100) and (111) surfaces of diamond. Photoemission results of AlGaN alloy films grown on 6H-SiC indicate a negative electron affinity for as-prepared and air exposed surfaces with high Al concentrations.
引用
收藏
页码:790 / 796
页数:7
相关论文
共 21 条
[1]  
BANDIS C, 1995, PHYS REV LETT, V74, P77
[2]   NEGATIVE ELECTRON-AFFINITY EFFECTS ON H-PLASMA EXPOSED DIAMOND(100) SURFACES [J].
BAUMANN, PK ;
NEMANICH, RJ .
DIAMOND AND RELATED MATERIALS, 1995, 4 (5-6) :802-805
[3]  
BAUMANN PK, 1994, MATER RES SOC SYMP P, V339, P69, DOI 10.1557/PROC-339-69
[4]  
BAUMANN PK, 1995, IN PRESS APPL SURF S
[5]  
BENJAMIN MC, 1994, MATER RES SOC SYMP P, V339, P81, DOI 10.1557/PROC-339-81
[6]  
BENJAMIN MC, 1994, APPL PHYS LETT, V64
[7]   Electron emission measurements from CVD diamond surfaces [J].
Bozeman, SP ;
Baumann, PK ;
Ward, BL ;
Powers, MJ ;
Cuomo, JJ ;
Nemanich, RJ ;
Dreifus, DL .
DIAMOND AND RELATED MATERIALS, 1996, 5 (6-8) :802-806
[8]   DIAMOND-NICKEL INTERFACES - CALCULATION OF THE ELECTRONIC AND ATOMIC-STRUCTURE AND SCHOTTKY BARRIERS [J].
ERWIN, SC ;
PICKETT, WE .
SURFACE & COATINGS TECHNOLOGY, 1991, 47 (1-3) :487-495
[9]   VANISHING SCHOTTKY BARRIERS IN DIAMOND METAL INTERFACES [J].
ERWIN, SC ;
PICKETT, WE .
SOLID STATE COMMUNICATIONS, 1992, 81 (11) :891-894
[10]   QUANTUM PHOTOYIELD OF DIAMOND(111) - STABLE NEGATIVE-AFFINITY EMITTER [J].
HIMPSEL, FJ ;
KNAPP, JA ;
VANVECHTEN, JA ;
EASTMAN, DE .
PHYSICAL REVIEW B, 1979, 20 (02) :624-627