Synthesis of amorphous carbon nitride using reactive ion beam sputtering deposition with grazing bombardment

被引：11

作者：

Bell, J ^{[1
]}

Chen, ZP ^{[1
]}

Olofinjana, A ^{[1
]}

机构：

[1] Queensland Univ Technol, Sch Mech Mfg & Med Engn, Res Concentrat Mat Techniques, Brisbane, Qld 4001, Australia

来源：

关键词：

carbon nitride; ion beam growth; ion bombardment; characterisation;

D O I：

10.1016/S0925-9635(01)00505-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Amorphous carbon nitride (a-C:N) thin films were synthesised on steel substrates using reactive ion beam sputtering deposition (RIBSD). A single ion beam is arranged to sputter the graphite target at 75 degrees incidence and concurrently bombard the growing film at grazing incidence angles of the ion beam. Nanoindentation, Raman spectroscopy, FTIR, FT-Raman and XPS were employed to characterise the mechanical and structural properties of the films. It was found that grazing incident bombardment has a significant effect on film structure through an increase in nitrogen content and formation of nitrogen doped structure. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：2184 / 2189

页数：6

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