Complementary Germanium Electron-Hole Bilayer Tunnel FET for Sub-0.5-V Operation

被引:98
作者
Lattanzio, Livio [1 ]
De Michielis, Luca [1 ]
Ionescu, Adrian M. [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Nanoelect Devices Lab, CH-1015 Lausanne, Switzerland
关键词
Band-to-band tunneling (BTBT); electron-hole (EH) bilayer; field-effect transistor (FET); germanium; subthreshold slope; tunnel FET (TFET);
D O I
10.1109/LED.2011.2175898
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, we present a novel device, the germanium electron-hole (EH) bilayer tunnel field-effect transistor, which exploits carrier tunneling through a bias-induced EH bilayer. The proposed architecture provides a quasi-ideal alignment between the tunneling path and the electric field controlled by the gate. The device principle and performances are studied by 2-D numerical simulations. This device allows interesting features in terms of low operating voltage (< 0.5 V), due to its super-steep subthreshold slope (SSAVG similar to 13 mV/dec over six decades of current), I-ON/I-OFF ratio of similar to 10(9), and drive current of I-ON similar to 10 mu A/mu m at V-DD = 0.5 V. The same structure with symmetric voltages can be used to achieve a p-type device with I-ON and I-OFF levels comparable to the n-type, which enables a straightforward implementation of complementary logic that could theoretically reach a maximum operating frequency of 1.39 GHz when V-DD = 0.25 V.
引用
收藏
页码:167 / 169
页数:3
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