Improvement of the homogeneity of optical thin films by ion-assisted deposition

被引：0

作者：

Lee, CC ^{[1
]}

Liou, YY ^{[1
]}

Jaing, CC ^{[1
]}

机构：

[1] NATL CENT UNIV,INST OPT SCI,CHUNGLI 320,TAIWAN

来源：

JOURNAL OF MODERN OPTICS | 1996年 / 43卷 / 06期

关键词：

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The inhomogeneity of thin films of ZrO2 and TiO2 was reduced by ion beam bombardment with mixed argon and oxygen as a working gas during deposition. The inhomogeneities of the films were calculated from transmission monitoring curves. The optimum ion beam voltage and ion beam current density are 900 V and 12 mu A cm(-2) for ZrO2 film, and 300 V and 15 mu A cm(-2) for TiO2 film.

引用

页码：1149 / 1154

页数：6

共 25 条

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