Crystalline orientation dependence of electrical properties of Mn Germanide/Ge(111) and (001) Schottky contacts

被引:44
|
作者
Nishimura, Tsuyoshi [1 ]
Nakatsuka, Osamu [1 ]
Akimoto, Shingo [1 ]
Takeuchi, Wakana [1 ]
Zaima, Shigeaki [1 ]
机构
[1] Nagoya Univ, Dept Crystalline Mat Sci, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
关键词
Manganese; Germanium; Epitaxial growth; Schottky barrier height; Fermi level pinning; Contact; BARRIERS; INHOMOGENEITY; GERMANIUM; FILMS;
D O I
10.1016/j.mee.2010.08.014
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated the crystalline orientation dependence of the electrical properties of Mn germanide/Ge(1 1 1) and (0 0 1) Schottky contacts. We prepared epitaxial and polycrystalline Mn5Ge3 layers on Ge(1 1 1) and (0 0 1) substrates, respectively. The Schottky barrier height (SBH) estimated from the current density-voltage characteristics for epitaxial Mn5Ge3/Ge(1 1 1) is as low as 0.30 eV, while the SBH of polycrystalline Mn5Ge3/Ge(0 0 1) is higher than 0.56 eV. On the other hand, the SBH estimated from capacitance-voltage characteristics are higher than 0.6 eV for both samples. The difference of these SBHs can be explained by the local carrier conduction through the small area with the low SBH regions in the epitaxial Mn5Ge3/Ge(1 1 1) contact. This result suggests the possibility that the lowering SBH takes place due to Fermi level depinning in epitaxial germanide/Ge(1 1 1) contacts. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:605 / 609
页数:5
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