Argon ion damage in self-assembled quantum dots structures

被引:35
作者
Schoenfeld, WV [1 ]
Chen, CH [1 ]
Petroff, PM [1 ]
Hu, EL [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
关键词
D O I
10.1063/1.122635
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of radiation damage exposure on InGaAs quantum wells and InAs quantum dots are compared using luminescence spectroscopy techniques. A large increase in the radiation resistance of the InAs quantum dots is observed and attributed to exciton localization in the quantum dots and a point defect strain gettering effect. (C) 1998 American Institute of Physics. [S0003-6951(98)03346-4].
引用
收藏
页码:2935 / 2937
页数:3
相关论文
共 20 条
[1]   Photoluminescence studies on radiation enhanced diffusion of dry-etch damage in GaAs and InP materials [J].
Chen, CH ;
Yu, DG ;
Hu, EL ;
Petroff, PM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :3684-3687
[2]   Radiation enhanced diffusion of low energy ion-induced damage [J].
Chen, CH ;
Green, DL ;
Hu, EL ;
Ibbetson, JP ;
Petroff, PM .
APPLIED PHYSICS LETTERS, 1996, 69 (01) :58-60
[3]   Diffusion and channeling of low-energy ions: The mechanism of ion damage [J].
Chen, CH ;
Green, DL ;
Hu, EL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2355-2359
[4]   Shell structure and electron-electron interaction in self-assembled InAs quantum dots [J].
Fricke, M ;
Lorke, A ;
Kotthaus, JP ;
MedeirosRibeiro, G ;
Petroff, PM .
EUROPHYSICS LETTERS, 1996, 36 (03) :197-202
[5]   Intermixing and shape changes during the formation of InAs self-assembled quantum dots [J].
García, JM ;
MedeirosRibeiro, G ;
Schmidt, K ;
Ngo, T ;
Feng, JL ;
Lorke, A ;
Kotthaus, J ;
Petroff, PM .
APPLIED PHYSICS LETTERS, 1997, 71 (14) :2014-2016
[6]  
GARCIA JM, 1996, APPL PHYS LETT C, V8, P3123
[7]   InAs quantum boxes: Highly efficient radiative traps for light emitting devices on Si [J].
Gerard, JM ;
Cabrol, O ;
Sermage, B .
APPLIED PHYSICS LETTERS, 1996, 68 (22) :3123-3125
[8]   ENERGY-DEPENDENCE AND DEPTH DISTRIBUTION OF DRY ETCHING-INDUCED DAMAGE IN III/V SEMICONDUCTOR HETEROSTRUCTURES [J].
GERMANN, R ;
FORCHEL, A ;
BRESCH, M ;
MEIER, HP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1475-1478
[9]   EFFECT OF SUPERLATTICES ON THE LOW-ENERGY ION-INDUCED DAMAGE IN GAAS/AL(GA)AS STRUCTURES - CHANNELING OR DIFFUSION [J].
GREEN, DL ;
HU, EL ;
STOFFEL, NG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06) :3311-3316
[10]   CHARACTERIZATION OF LOW-ENERGY ION-INDUCED DAMAGE USING THE MULTIPLE-QUANTUM-WELL PROBE TECHNIQUE WITH AN INTERVENING SUPERLATTICE [J].
GREEN, DL ;
HU, EL ;
PETROFF, PM ;
LIBERMAN, V ;
NOONEY, M ;
MARTIN, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2249-2253