Modelling lifetime degradation in boron-doped Czochralski silicon

被引:8
作者
Voronkov, Vladimir V. [1 ]
Falster, Robert [1 ]
Batunina, Anna V. [2 ]
机构
[1] MEMC Elect Mat, I-39012 Merano, Italy
[2] Inst Rare Met, Moscow 109017, Russia
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2011年 / 208卷 / 03期
关键词
boron; lifetime degradation; oxygen; silicon;
D O I
10.1002/pssa.201000191
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electron lifetime in boron-and oxygen-containing silicon is known to decrease under illumination. The emerging recombination centre was previously thought to be a complex B(s)O(2), of a substitutional boron atom and an oxygen dimer. However this attribution has turned out to be inconsistent with recently published data. A new model was proposed, based on a latent single-positive complex B(i)O(2) that involves an interstitial boron atom B(i) rather than B(s). Excess electrons lead to recharging the latent B(i)O(2) centre into the neutral state, with subsequent reconstruction into recombination-active configuration. This model was used to simulate the reported data on production of recombination centres, in a wide range of applied illumination intensity - and found to provide a good reproduction of the data. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:576 / 579
页数:4
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