Adhesion of ultrathin ZrO2(111) films on Ni(111) from first principles
被引:118
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作者:
Christensen, A
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机构:Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Christensen, A
Carter, EA
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机构:Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Carter, EA
机构:
[1] Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
[2] Tech Univ Denmark, Dept Phys, Ctr Atom Scale Mat Phys, DK-2800 Lyngby, Denmark
来源:
JOURNAL OF CHEMICAL PHYSICS
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2001年
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114卷
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13期
关键词:
D O I:
10.1063/1.1352079
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
We have studied the ZrO2(111)/Ni(111) interface using the ultrasoft pseudopotential formalism within density functional theory. We find that ZrO2(111) adheres relatively strongly at the monolayer level but thicker ceramic films interact weakly with the Ni-substrate. We argue that the cohesion changes character from dominantly image charge interactions for thick ceramic films to more covalent for monolayer ZrO2(111) films. We provide an analysis of energetic, structural and electronic aspects of the ZrO2/Ni interface as a function of the thickness of the oxide layer. We also address the role of the exchange-correlation density functional parameterization for modeling the oxide and metal/oxide interface and discuss the sensitivity of the supercell approximation for metal/oxide interface properties. (C) 2001 American Institute of Physics.
机构:
UCL, Dept Chem, 20 Gordon St, London WC1H 0AJ, EnglandUCL, Dept Chem, 20 Gordon St, London WC1H 0AJ, England
Cadi-Essadek, Abdelaziz
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机构:
Roldan, Alberto
de Leeuw, Nora H.
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机构:
UCL, Dept Chem, 20 Gordon St, London WC1H 0AJ, England
Cardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, S Glam, WalesUCL, Dept Chem, 20 Gordon St, London WC1H 0AJ, England
机构:
Indiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USAIndiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USA
Guo, Xingye
Zhang, Yi
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机构:
Indiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USAIndiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USA
Zhang, Yi
Jung, Yeon-Gil
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机构:
Changwon Natl Univ, Sch Mat Sci & Engn, Chang Won 641773, Gyeongnam, South KoreaIndiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USA
Jung, Yeon-Gil
Li, Li
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机构:
Praxair Surface Technol Inc, Indianapolis, IN 46222 USAIndiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USA
Li, Li
Knapp, James
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机构:
Praxair Surface Technol Inc, Indianapolis, IN 46222 USAIndiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USA
Knapp, James
Zhang, Jing
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h-index: 0
机构:
Indiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USAIndiana Univ Purdue Univ, Dept Mech Engn, Indianapolis, IN 46202 USA
机构:
TU Wien, Inst Appl Phys, Vienna, AustriaTU Wien, Inst Appl Phys, Vienna, Austria
Lackner, Peter
Zou, Zhiyu
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机构:
TU Wien, Inst Appl Phys, Vienna, AustriaTU Wien, Inst Appl Phys, Vienna, Austria
Zou, Zhiyu
Mayr, Sabrina
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机构:
TU Wien, Inst Appl Phys, Vienna, AustriaTU Wien, Inst Appl Phys, Vienna, Austria
Mayr, Sabrina
Choi, Joong-Il Jake
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机构:
TU Wien, Inst Appl Phys, Vienna, Austria
Inst for Basic Sci Korea, Ctr Nanomat & Chem React, Daejeon 305701, South KoreaTU Wien, Inst Appl Phys, Vienna, Austria
Choi, Joong-Il Jake
Diebold, Ulrike
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机构:
TU Wien, Inst Appl Phys, Vienna, AustriaTU Wien, Inst Appl Phys, Vienna, Austria
Diebold, Ulrike
Schmid, Michael
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机构:
TU Wien, Inst Appl Phys, Vienna, AustriaTU Wien, Inst Appl Phys, Vienna, Austria