Optimum Design of a Dual-Range Force Sensor for Achieving High Sensitivity, Broad Bandwidth, and Large Measurement Range

被引:19
作者
Jiang, Jun [1 ]
Chen, Weihai [1 ]
Liu, Jingmeng [1 ]
Chen, Wenjie [2 ]
Zhang, Jianbin [3 ]
机构
[1] Beihang Univ, Sch Automat Sci & Elect Engn, Beijing 100083, Peoples R China
[2] Singapore Inst Mfg Technol, Mechatron Grp, Singapore 638075, Singapore
[3] Beihang Univ, Sch Mech Engn, Beijing 100083, Peoples R China
基金
高等学校博士学科点专项科研基金; 中国国家自然科学基金;
关键词
Force sensor; compliant mechanism; nanoimprint; structural optimization; PARTICLE SWARM OPTIMIZATION; NANOIMPRINT LITHOGRAPHY; ROBUST; SYSTEM;
D O I
10.1109/JSEN.2014.2360885
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Force control is very crucial in nanoimprint lithography (NIL). It is necessary to develop a high-performance force sensor to provide real-time force feedback for the control process. Due to the unique procedure of NIL, the developed force sensor should include a high sensitivity, broad bandwidth, and large measurable range. However, these characteristics are normally conflicting in nature and cannot be physically avoided by any force transducers so far. To address this problem, this paper presents a novel dual-range force sensor, and uses a heuristic multiobjective optimization method to make a tradeoff among these characteristics. This method is based on the particle swarm optimization algorithm, meanwhile employs the Pareto ranking scheme to find optimal solutions. Through proper optimization, not only the three characteristics are compromised, the lowest stress concentration of the sensor body is maintained as well. To demonstrate the effectiveness of the optimization, numerical simulations with finite-element software COMSOL are conducted. A prototype sensor is then fabricated according to the optimization results. The simulation and prototype test results indicate that the optimized sensor has a resolution down to 800 mu N, a bandwidth up to 150 Hz, and a measurable range up to 180 N. All the results prove that the developed force sensor possesses a good property for high-performance force measurement, and satisfies the needs of NIL as well.
引用
收藏
页码:1114 / 1123
页数:10
相关论文
共 25 条
[1]  
[Anonymous], 2014, PROD INF COMM DUAL R
[2]   Design and characterization of a novel, robust, tri-axial force sensor [J].
Baki, Peter ;
Szekely, Gabor ;
Kosa, Gabor .
SENSORS AND ACTUATORS A-PHYSICAL, 2013, 192 :101-110
[3]   Design, manufacturing and implementation of a novel 2-axis force sensor for haptic applications [J].
Buttafuoco, A. ;
Lenders, C. ;
Clavel, R. ;
Lambert, P. ;
Kinnaert, M. .
SENSORS AND ACTUATORS A-PHYSICAL, 2014, 209 :107-114
[4]   Passive compliant wafer stage for single-step nano-imprint lithography [J].
Choi, KB ;
Lee, JJ .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2005, 76 (07)
[5]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87
[6]   Handling multiple objectives with particle swarm optimization [J].
Coello, CAC ;
Pulido, GT ;
Lechuga, MS .
IEEE TRANSACTIONS ON EVOLUTIONARY COMPUTATION, 2004, 8 (03) :256-279
[7]   Evolutionary multi-objective optimization: A historical view of the field [J].
Coello Coello, Carlos A. .
IEEE COMPUTATIONAL INTELLIGENCE MAGAZINE, 2006, 1 (01) :28-36
[8]   Optimization of a Low-Cost Force Sensor for Spinal Orthosis Applications [J].
Evans, Katherine R. ;
Lou, Edmond ;
Faulkner, Gary .
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2013, 62 (12) :3243-3250
[9]   Multiobjective particle swarm optimization for parameter estimation in hydrology [J].
Gill, M. Kashif ;
Kaheil, Yasir H. ;
Khalil, Abedalrazq ;
McKee, Mac ;
Bastidas, Luis .
WATER RESOURCES RESEARCH, 2006, 42 (07)
[10]   Nanoimprint lithography: Methods and material requirements [J].
Guo, L. Jay .
ADVANCED MATERIALS, 2007, 19 (04) :495-513