Experimental Demonstration of the Impact of the Parameters of Floating Guard Ring on Planar InP/InGaAs-Based Avalanche Photodiodes' Performance and Its Optimization

被引:1
|
作者
Zhang, Junyang [1 ,2 ,3 ]
Li, Xuanzhang [1 ,2 ,3 ]
Du, Chunhua [1 ,3 ,4 ]
Jiang, Yang [1 ,3 ]
Ma, Ziguang [1 ,3 ]
Chen, Hong [1 ,3 ,5 ]
Jia, Haiqiang [1 ,3 ,5 ]
Wang, Wenxin [1 ,3 ,5 ]
Deng, Zhen [1 ,3 ,4 ]
机构
[1] Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing Key Lab New Energy Mat & Devices,Key Lab, Beijing 100190, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Univ Acad Sci, Ctr Mat & Optoelect Engn, Beijing 100049, Peoples R China
[4] Yangtze River Delta Phys Res Ctr, Liyang 213000, Jiangsu, Peoples R China
[5] Songshan Lake Mat Lab, Dongguan 523808, Guangdong, Peoples R China
来源
IEEE PHOTONICS JOURNAL | 2022年 / 14卷 / 02期
基金
中国国家自然科学基金;
关键词
Physics; Avalanche photodiodes; Surface treatment; Epitaxial growth; Absorption; Surface topography; Scanning electron microscopy; Planar InP; InGaAs-based SAGCM APDs; FGR; punch-through; breakdown; BREAKDOWN VOLTAGE; PHOTO-DIODES; DESIGN; PIN; SUPPRESSION; ABSORPTION; CHARGE; LAYERS;
D O I
10.1109/JPHOT.2022.3153649
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Suppression pre-breakdown in planar separated absorption, grading, charge and multiplication (SAGCM) avalanche photodiodes (APDs) with the help of Floating Guard Ring (FGR) is still a research hotspot. In this paper, a lattice-matched InP/InGaAs-based SAGCM structure is grown by Metal-Organic Chemical Vapor Deposition and thus the planar 50 mu m photosensitive area APDs with different FGR structures are fabricated using zinc diffusion process. The effects of the different lengths of FGR (4 mu m, 8 mu m, 12 mu m, 16 mu m), and the different distances between FGR and the Zn diffused p+ region (4 mu m, 6 mu m, 8 mu m, 10 mu m) on the optoelectrical characteristics are deeply studied. The results from optical microscope, scanning electron microscope and current-voltage curves reveal that there is an optimal length and distance for the punch-through and breakdown voltage. Furthermore, the nA-level dark current, gain (M) of up to 10 at breakdown voltage, responsibility as high as 9.01 A/W at M = 10 and quantum efficiency equaling to 72% are also tested and calculated, proving the good performance of our devices. The optimized FGR parameters and related structure are expected to be helpful for obtaining high-performance, small-size InP/InGaAs-based APDs.
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页数:6
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