共 23 条
Experimental Demonstration of the Impact of the Parameters of Floating Guard Ring on Planar InP/InGaAs-Based Avalanche Photodiodes' Performance and Its Optimization
被引:1
|作者:
Zhang, Junyang
[1
,2
,3
]
Li, Xuanzhang
[1
,2
,3
]
Du, Chunhua
[1
,3
,4
]
Jiang, Yang
[1
,3
]
Ma, Ziguang
[1
,3
]
Chen, Hong
[1
,3
,5
]
Jia, Haiqiang
[1
,3
,5
]
Wang, Wenxin
[1
,3
,5
]
Deng, Zhen
[1
,3
,4
]
机构:
[1] Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing Key Lab New Energy Mat & Devices,Key Lab, Beijing 100190, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Univ Acad Sci, Ctr Mat & Optoelect Engn, Beijing 100049, Peoples R China
[4] Yangtze River Delta Phys Res Ctr, Liyang 213000, Jiangsu, Peoples R China
[5] Songshan Lake Mat Lab, Dongguan 523808, Guangdong, Peoples R China
来源:
基金:
中国国家自然科学基金;
关键词:
Physics;
Avalanche photodiodes;
Surface treatment;
Epitaxial growth;
Absorption;
Surface topography;
Scanning electron microscopy;
Planar InP;
InGaAs-based SAGCM APDs;
FGR;
punch-through;
breakdown;
BREAKDOWN VOLTAGE;
PHOTO-DIODES;
DESIGN;
PIN;
SUPPRESSION;
ABSORPTION;
CHARGE;
LAYERS;
D O I:
10.1109/JPHOT.2022.3153649
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Suppression pre-breakdown in planar separated absorption, grading, charge and multiplication (SAGCM) avalanche photodiodes (APDs) with the help of Floating Guard Ring (FGR) is still a research hotspot. In this paper, a lattice-matched InP/InGaAs-based SAGCM structure is grown by Metal-Organic Chemical Vapor Deposition and thus the planar 50 mu m photosensitive area APDs with different FGR structures are fabricated using zinc diffusion process. The effects of the different lengths of FGR (4 mu m, 8 mu m, 12 mu m, 16 mu m), and the different distances between FGR and the Zn diffused p+ region (4 mu m, 6 mu m, 8 mu m, 10 mu m) on the optoelectrical characteristics are deeply studied. The results from optical microscope, scanning electron microscope and current-voltage curves reveal that there is an optimal length and distance for the punch-through and breakdown voltage. Furthermore, the nA-level dark current, gain (M) of up to 10 at breakdown voltage, responsibility as high as 9.01 A/W at M = 10 and quantum efficiency equaling to 72% are also tested and calculated, proving the good performance of our devices. The optimized FGR parameters and related structure are expected to be helpful for obtaining high-performance, small-size InP/InGaAs-based APDs.
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页数:6
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