Effect of iron doping on structural, optical and electrical properties of sprayed In2O3 thin films

被引:41
作者
Beji, Nasreddine [1 ]
Souli, Mehdi [1 ]
Ajili, Mejda [1 ]
Azzaza, Sonia [2 ]
Alleg, Safia [2 ]
Turki, Najoua Kamoun [1 ]
机构
[1] Fac Sci Tunis El Manar, LPMC, Tunis 2092, Tunisia
[2] Univ Badji Mokhtar, Fac Sci, Dept Phys, Lab Magnetisme & Spect Solides LM2S, Annaba 23000, Algeria
关键词
In2O3 thin films; Iron doping; Spray pyrolysis technique; Annealing under nitrogen atmosphere; DOPED INDIUM OXIDE; SOL-GEL METHOD; PHYSICAL-PROPERTIES; PYROLYSIS; DEPOSITION; PRECURSOR; SENSORS; ITO; FE;
D O I
10.1016/j.spmi.2015.01.015
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Iron doped indium oxide thin films were grown by chemical spray pyrolysis technique at different concentrations y = [Fe2+]/[In3+] (y = 0, 2, 4 and 6 at.%). Structural, morphological, optical and electrical properties were studied by X-ray diffraction, Raman spectroscopy, atomic force microscopy, spectrophotometer, fluorescence spectrometer and Hall Effect. The XRD analyses show that indium oxide crystallizes into cubic structure with (222) as a preferred orientation. An enhancement of the crystallinity followed by a change in plan orientation from (222) to (400) was observed when iron doping concentrations is increasing. The optimum of In2O3 crystal structure is obtained for iron concentration equals to 6 at.%. Transmission and reflection spectra reveal the presence of interference fringes with oscillatory character indicating the good uniformity and optical homogeneity of deposited films. The obtained band gap energy E-g is in the range of [3.29-3.45] eV. The single oscillator energy E-0 and dispersion energy E-d were determined by Wemple model using the envelope method applied for all obtained XRD spectra. We found that E-0 = 2 x E-g for iron doped films and E-0= 1.5 x E-g for undoped ones. Measured electrical resistivity decreases from rho = 6502 x 10(-4) to 197.9 x 10(-4) Omega cm for respectively undoped and In2O3:Fe(6 at.%) thin films. A heat treatment was carried out at different temperatures (200 degrees C, 300 degrees C and 400 degrees C) under nitrogen atmosphere to try to reduce more electrical resistivity. We found that it decreases to about 26.94 x 10(-4) Omega cm for 300 degrees C annealing temperature. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:114 / 128
页数:15
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