Nano-indentation method for the measurement of the Poisson's ratio of MEMS thin films

被引：22

作者：

Kim, JH ^{[1
]}

Yeon, SC ^{[1
]}

Jeon, YK ^{[1
]}

Kim, JG ^{[1
]}

Kim, YH ^{[1
]}

机构：

[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Inst Adv Aerosp Technol, Seoul, South Korea

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 2003年 / 108卷 / 1-3期

关键词：

Poisson's ratio; nano-indentation; MEMS; thin film; material properties;

D O I：

10.1016/j.sna.2003.07.001

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A nano-indentation method is presented to measure the Poisson's ratio of thin films for micro-electro-mechanical systems (MEMS) applications. Double-ring shaped specimen is designed to facilitate the measurement of the Poisson's ratio. The Poisson's ratio can be obtained through analyzing the load-deflection data of the double ring specimen subjected to nano-indenter loading. The compatibility to the surface micromaching makes in situ measurement of the Poisson's ratio feasible. The Poisson's ratio is obtained as local quantity, not an average value over the wafer, due to the small size of the specimen. To validate the proposed method, the Poisson's ratio of LPCVD polysilicon with thickness of 2.33 mum is measured. Experimental results reveal that the Poisson's ratio of the polysilicon film is 0.254 +/- 0.0125. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：20 / 27

页数：8

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