Band gap and effective electron mass of cubic InN

被引:13
作者
Schley, P. [1 ]
Napierala, C. [1 ]
Goldhahn, R. [1 ]
Gobsch, G. [1 ]
Schoermann, J. [2 ]
As, D. J. [2 ]
Lischka, K. [2 ]
Feneberg, M. [3 ]
Thonke, K. [3 ]
Fuchs, F. [4 ]
Bechstedt, F. [4 ]
机构
[1] Tech Univ Ilmenau, Inst Phys, PF 100565, D-98684 Ilmenau, Germany
[2] Univ Paderborn, Dept Phys, Paderborn 33098, Germany
[3] Univ Ulm, Inst Semicond Phys, Ulm 89069, Germany
[4] Friedrich Shiller Univ Jena, Inst Solid State Theory & Opt, Jena 07743, Germany
来源
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 6 | 2008年 / 5卷 / 06期
关键词
D O I
10.1002/pssc.200778482
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We succeeded in growing single crystalline c-InN films on 3C-SiC substrate with a c-Ga-N buffer layer by MBE. Spectroscopic ellipsometry is applied in order to determine the complex dielectric function for cubic InN from mid-infrared into the visible spectral region. The high electron densities above 10(19) cm(3) cause pronounced Bursteiu-Moss shifts at the gap. Taking into account the non-parabolicily and the filling of the conduction band, data analysis yields renormalized band edges between 0.430 and 0.455 eV. Including carrier-induced band-gap renormalization we estimate a zero-density band gap of similar to 0.596 eV for c-InN with a corresponding effective electron mass of 0,041 m(0) at the Gamma point of the Brillouin zone.
引用
收藏
页码:2342 / +
页数:2
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