Demonstration of Threshold Switching and Bipolar Resistive Switching in Ag/SnOx/TiN Memory Device

被引:6
作者
Pyo, Juyeong [1 ]
Woo, Seung-Jin [1 ]
Lee, Kisong [2 ]
Kim, Sungjun [1 ]
机构
[1] Dongguk Univ, Div Elect & Elect Engn, Seoul 04620, South Korea
[2] Dongguk Univ, Dept Informat & Commun Engn, Seoul 04620, South Korea
基金
新加坡国家研究基金会;
关键词
memristor; threshold switching; resistive switching; metal oxides; MECHANISMS;
D O I
10.3390/met11101605
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, we observed the duality of threshold switching and non-volatile memory switching of Ag/SnOx/TiN memory devices by controlling the compliance current (CC) or pulse amplitude. The insulator thickness and chemical analysis of the device stack were confirmed by transmission electron microscope (TEM) images of the Ag/SnOx/TiN stack and X-ray photoelectron spectroscopy (XPS) of the SnOx film. The threshold switching was achieved at low CC (50 mu A), showing volatile resistive switching. Optimal CC (5 mA) for bipolar resistive switching conditions with a gradual transition was also found. An unstable low-resistance state (LRS) and negative-set behavior were observed at CCs of 1 mA and 30 mA, respectively. We also demonstrated the pulse operation for volatile switching, set, reset processes, and negative-set behaviors by controlling pulse amplitude and polarity. Finally, the potentiation and depression characteristics were mimicked by multiple pulses, and MNIST pattern recognition was calculated using a neural network, including the conductance update for a hardware-based neuromorphic system.
引用
收藏
页数:7
相关论文
共 45 条
[1]   Improving linearity by introducing Al in HfO2 as a memristor synapse device [J].
Chandrasekaran, Sridhar ;
Simanjuntak, Firman Mangasa ;
Saminathan, R. ;
Panda, Debashis ;
Tseng, Tseung-Yuen .
NANOTECHNOLOGY, 2019, 30 (44)
[2]   Schottky Emission Distance and Barrier Height Properties of Bipolar Switching Gd:SiOx RRAM Devices under Different Oxygen Concentration Environments [J].
Chen, Kai-Huang ;
Tsai, Tsung-Ming ;
Cheng, Chien-Min ;
Huang, Shou-Jen ;
Chang, Kuan-Chang ;
Liang, Shu-Ping ;
Young, Tai-Fa .
MATERIALS, 2018, 11 (01)
[3]   Analysis of Leakage Current of HfO2/TaOx-Based 3-D Vertical Resistive Random Access Memory Array [J].
Chen, Zhisheng ;
Song, Renjun ;
Huo, Qiang ;
Ren, Qirui ;
Zhang, Chenrui ;
Li, Linan ;
Zhang, Feng .
MICROMACHINES, 2021, 12 (06)
[4]   Short-Term Memory Dynamics of TiN/Ti/TiO2/SiOx/Si Resistive Random Access Memory [J].
Cho, Hyojong ;
Kim, Sungjun .
NANOMATERIALS, 2020, 10 (09) :1-13
[5]   Emulation of Biological Synapse Characteristics from Cu/AlN/TiN Conductive Bridge Random Access Memory [J].
Cho, Hyojong ;
Kim, Sungjun .
NANOMATERIALS, 2020, 10 (09) :1-11
[6]   Nonlinear Characteristics of Complementary Resistive Switching in HfAlOx-Based Memristor for High-Density Cross-Point Array Structure [J].
Choi, Junhyeok ;
Kim, Sungjun .
COATINGS, 2020, 10 (08)
[7]   Phase-Change Memory-Towards a Storage-Class Memory [J].
Fong, Scott W. ;
Neumann, Christopher M. ;
Wong, H. -S. Philip .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (11) :4374-4385
[8]   In-memory computing with resistive switching devices [J].
Ielmini, Daniele ;
Wong, H. -S. Philip .
NATURE ELECTRONICS, 2018, 1 (06) :333-343
[9]   Negative differential resistance effect and dual bipolar resistive switching properties in a transparent Ce-based devices with opposite forming polarity [J].
Ismail, Muhammad ;
Kim, Sungjun .
APPLIED SURFACE SCIENCE, 2020, 530
[10]   Control of the Boundary between the Gradual and Abrupt Modulation of Resistance in the Schottky Barrier Tunneling-Modulated Amorphous Indium-Gallium-Zinc-Oxide Memristors for Neuromorphic Computing [J].
Jang, Jun Tae ;
Ahn, Geumho ;
Choi, Sung-Jin ;
Kim, Dong Myong ;
Kim, Dae Hwan .
ELECTRONICS, 2019, 8 (10)