Research on the growth of β-(AlGa)2O3 film and the analysis of electrical characteristics of Ni/Au Schottky contact using Tung's model

被引:8
作者
Feng, Qian [1 ]
Hu, Zhuangzhuang [1 ]
Feng, Zhaoqing [1 ]
Xing, Xiangyu [1 ]
Zuo, Yan [1 ]
Yan, Guangshuo [1 ]
Lu, Xiaoli [1 ]
Zhang, Chunfu [1 ]
Zhou, Hong [1 ]
Zhang, Jincheng [1 ]
机构
[1] Xidian Univ, Sch Microelect, State Key Discipline Lab Wide Bandgap Semicond Te, Xian 710071, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
Aluminum-gallium oxide; Schottky barrier diodes; Inhomogeneous Schottky barrier height; Thermionic emission; TEMPERATURE; DIODES;
D O I
10.1016/j.spmi.2018.05.032
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Single crystalline beta-(AlGa)(2)O-3 epilayer was grown on beta-Ga2O3 (010) substrate using pulsed laser deposition. By high resolution X-ray diffraction and X-ray photoelectron spectroscopy measurements, the Al composition was determined to be 11%43%, somewhat larger than that of target. In addition, Schottky diodes were fabricated on epitaxial beta-(Al0.11Ga0.89)(2)O-3 film using Ni/Au as the anode contacts and the electrical characteristics were performed in the temperature range from 300 K to 573 K. From the forward I-V curves, the Phi(b) and n were obtained and they are both strongly dependent on the temperature, which was attributed to the inhomogeneous Schottky barrier height distribution. According to the Tung's model, the mean barrier height of 1.38 eV and A* of 46.52 Acm(-2)K(-2) are extracted by the modified Richardson plot.
引用
收藏
页码:441 / 447
页数:7
相关论文
共 27 条
[1]   Barrier characteristics of Cd/p-GaTe Schottky diodes based on I-V-T measurements [J].
Abay, B ;
Çankaya, G ;
Güder, HS ;
Efeoglu, H ;
Yogurtçu, YK .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2003, 18 (02) :75-81
[2]   Temperature-Dependent Characteristics of Ni/Au and Pt/Au Schottky Diodes on β-Ga2O3 [J].
Ahn, Shihyun ;
Ren, F. ;
Yuan, L. ;
Pearton, S. J. ;
Kuramata, A. .
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2017, 6 (01) :P68-P72
[3]   Role of self-trapped holes in the photoconductive gain of β-gallium oxide Schottky diodes [J].
Armstrong, Andrew M. ;
Crawford, Mary H. ;
Jayawardena, Asanka ;
Ahyi, Ayayi ;
Dhar, Sarit .
JOURNAL OF APPLIED PHYSICS, 2016, 119 (10)
[4]   Inhomogeneities in Ni/4H-SiC Schottky barriers: Localized fermi-level pinning by defect states [J].
Ewing, D. J. ;
Porter, L. M. ;
Wahab, Q. ;
Ma, X. ;
Sudharshan, T. S. ;
Tumakha, S. ;
Gao, M. ;
Brillson, L. J. .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (11)
[5]   High-quality 2" bulk-like free-standing GaN grown by hydride vapour phase epitaxy on a Si-doped metal organic vapour phase epitaxial GaN template with an ultra low dislocation density [J].
Gogova, D ;
Larsson, H ;
Kasic, A ;
Yazdi, GR ;
Ivanov, I ;
Yakimova, R ;
Monemar, B ;
Aujol, E ;
Frayssinet, E ;
Faurie, JP ;
Beaumont, B ;
Gibart, P .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (03) :1181-1185
[6]   First-principles study of the structural, electronic, and optical properties of Ga2O3 in its monoclinic and hexagonal phases [J].
He, Haiying ;
Orlando, Roberto ;
Blanco, Miguel A. ;
Pandey, Ravindra ;
Amzallag, Emilie ;
Baraille, Isabelle ;
Rerat, Michel .
PHYSICAL REVIEW B, 2006, 74 (19)
[7]   Nearly stress-free substrates for GaN homoepitaxy [J].
Hermann, M. ;
Gogova, D. ;
Siche, D. ;
Schmidbauer, M. ;
Monemar, B. ;
Stutzmann, M. ;
Eickhoff, M. .
JOURNAL OF CRYSTAL GROWTH, 2006, 293 (02) :462-468
[8]   Recent progress in Ga2O3 power devices [J].
Higashiwaki, Masataka ;
Sasaki, Kohei ;
Murakami, Hisashi ;
Kumagai, Yoshinao ;
Koukitu, Akinori ;
Kuramata, Akito ;
Masui, Takekazu ;
Yamakoshi, Shigenobu .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2016, 31 (03)
[9]   Gallium oxide (Ga2O3) metal-semiconductor field-effect transistors on single-crystal β-Ga2O3 (010) substrates [J].
Higashiwaki, Masataka ;
Sasaki, Kohei ;
Kuramata, Akito ;
Masui, Takekazu ;
Yamakoshi, Shigenobu .
APPLIED PHYSICS LETTERS, 2012, 100 (01)
[10]   Growth and Band Gap Control of Corundum-Structured α-(AlGa)2O3 Thin Films on Sapphire by Spray-Assisted Mist Chemical Vapor Deposition [J].
Ito, Hiroshi ;
Kaneko, Kentaro ;
Fujita, Shizuo .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (10)