Plasma potential measurement in 2.45 GHz electron cyclotron resonance plasma with a magnetron magnetic field configuration

被引：0

作者：

Kim, Seong Bong ^{[1
,2
]}

Namkung, Won ^{[2
]}

Cho, Moohyun ^{[2
]}

Kim, Dae Chul ^{[1
]}

Yoo, Suk Jae ^{[1
]}

机构：

[1] Natl Fus Res Inst, Div Appl Technol Res, Taejon 305333, South Korea

[2] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, South Korea

来源：

THIN SOLID FILMS | 2010年 / 518卷 / 22期

关键词：

Hyperthermal neutral beam; Plasma potential measurement; Ion kinetic energy distribution; ECR plasma; ENERGY-DISTRIBUTIONS;

D O I：

10.1016/j.tsf.2010.03.153

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A 2.45 GHz electron cyclotron resonance (ECR) plasma source with a magnetron magnetic field configuration has been developed for the generation of high flux of hyperthermal neutral beams (HNB). The plasma potential in ECR plasma is required to obtain the HNB energy. In this study, the axial profile of the plasma potential was deduced from the ion kinetic energy distribution (IED) which was measured using an ion energy analyzer. It was found that the IED was broadened with a full width half maximum (FWHM), representing the difference between the maximum plasma potential and the minimum plasma potential. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：6690 / 6693

页数：4

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