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Resonance shifts in SPR curves of nonabsorbing, weakly absorbing, and strongly absorbing dielectrics
被引:36
作者:
Ekgasit, S
[1
]
Tangcharoenbumrungsuk, A
Yu, F
Baba, A
Knoll, W
机构:
[1] Chulalongkorn Univ, Fac Sci, Dept Chem, Sensor Res Unit, Bangkok 10330, Thailand
[2] Max Planck Inst Polymer Res, D-55128 Mainz, Germany
关键词:
SPR;
surface plasmon resonance;
evanescent field;
absorbing dielectrics;
nonabsorbing dielectrics;
D O I:
10.1016/j.snb.2004.07.015
中图分类号:
O65 [分析化学];
学科分类号:
070302 ;
081704 ;
摘要:
The resonance shifts (i.e., the resonance angle and the reflectance minimum) in surface plasmon resonance (SPR) curves due to the complex refractive index and/or thickness variations of dielectric films were investigated. For both, nonabsorbing and absorbing dielectrics, the resonance angle shifts linearly with the refractive index and/or thickness variations. The reflectance minimum of the nonabsorbing dielectric does not change as the resonance angle shifts. For an absorbing dielectric, the direction of the reflectance change depends strongly on the magnitude of the absorption and thickness of the metal film. The reflectance minimum of the sensor with a thin metal film decreases before increasing while that of the sensor with a thick metal film continuously increases as the absorption of the dielectric film increases. The phenomena were theoretically explained based on the SPR-gencrated evanescent field at the metal/dielectric interface associated with the optical properties of the sensor architecture. (c) 2004 Elsevier B.V. All rights reserved.
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页码:532 / 541
页数:10
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