RF magnetron-sputtering deposition of pyroelectric lithium tantalate thin films on ruthenium dioxide

被引：22

作者：

Combette, Philippe ^{[1
]}

Nougaret, Laurianne ^{[1
]}

Giani, Alain ^{[1
]}

Pascal-delannoy, Frederique ^{[1
]}

机构：

[1] Univ Montpellier 2, CNRS, UMR 5507, Ctr Elect & Microoptoelect Montpellier, F-34095 Montpellier 05, France

来源：

JOURNAL OF CRYSTAL GROWTH | 2007年 / 304卷 / 01期

关键词：

physical vapor depostion processes; polycrystalline deposition; dielectric materials; ferroelectric materials; infrared devices;

D O I：

10.1016/j.jcrysgro.2007.02.006

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Lithium tantalate (LiTaO3) thin films were deposited on ruthenium dioxide (RuO2) electrode by reactive radio frequency (RF) magnetron sputtering with a lithium dioxide-tantalum pentoxide (Li2O2/Ta2O5) (50-50% mole ratio) target. This article presents morphological, structural, dielectric and pyroelectric studies of LiTaO3 thin films as function of growth conditions (RF power, gas pressure and temperature). The final aim is to improve the pyroelectric coefficient for thermal detectors applications. The best pyroelectric coefficient of LiTaO3 thin films (400 nm) equal to 60 mu C/m(2) K was obtained for a growth temperature of 400 degrees C, and a pressure of 10 mTorr. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：90 / 96

页数：7

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