Anomalous growth and characterization of carbon-coated nickel silicide nanowires

被引:24
作者
Lee, KS
Mo, YH
Nahm, KS
Shim, HW
Suh, EK
Kim, JR
Kim, JJ
机构
[1] Chonbuk Natl Univ, Sch Chem Engn & Technol, Chonju 561756, South Korea
[2] Chonbuk Natl Univ, Dept Phys, Chonju 561756, South Korea
[3] Chonbuk Natl Univ, Dept Semicond Sci & Technol, Chonju 561756, South Korea
关键词
D O I
10.1016/j.cplett.2003.11.107
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Carbon-coated nickel silicide nanowires (C-coated NiSi NWs) were prepared in a radio-frequency-induction heating chemical vapor deposition (RF-CVD) reactor. The growth of the NiSi nanowires and the coating of the NWs with carbon layers simultaneously took place in the reaction. The nanowires grew straight with the length of more than 10 mum and the average diameter ranging in 20-40 nm. The nanowires were coated with a carbon layer with thickness of 1.5-1.7 nm. The resistivity of individual NiSi nanowire was about 370 muOmega cm at room temperature and it decreased monotonically as the temperature was lowered and became saturated at low temperatures, indicating the growth of metallic NiSi nanowires. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:215 / 218
页数:4
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