Simulation of electron spectra for surface analysis (SESSA): a novel software tool for quantitative Auger-electron spectroscopy and X-ray photoelectron spectroscopy

被引:224
作者
Smekal, W
Werner, WSM
Powell, CJ
机构
[1] Vienna Univ Technol, Inst Allgemeine Phys, A-1040 Vienna, Austria
[2] Natl Inst Stand & Technol, Surface & Microanal Sci Div, Gaithersburg, MD 20899 USA
关键词
scattering; attenuation; electron; spectroscopy; microscopy; energy loss; backscattering; elastic; inelastic;
D O I
10.1002/sia.2097
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A description of a new NIST database for quantitative Auger-electron and X-ray photoelectron spectroscopy (AES/XPS) is given: Simulation of Electron Spectra for Surface Analysis (SESSA). This database contains extensive sets of data for the physical quantities relevant to AES and XPS. The internal databases are linked to a user interface via a small expert system that allows a user to automatically retrieve data needed for a specific practical application. SESSA can simulate AES and XPS spectra for a multilayered thin-film sample for measurement conditions specified by the user. Experimental information needed by SESSA is entered via an interface that matches the settings of AES/XPS instrumentation. The structure of SESSA is described together with information on special features, unique capabilities, and sources of the physical data. Examples of practical applications of SESSA for angle-resolved XPS on Al and Si samples, determination of the depth distribution function in XPS, and the use of empirical peak shapes for spectrum simulation are given. These and other applications are contained in SESSA in the form of tutorial files with command-language statements that can be loaded into SESSA and modified as necessary for similar simulations. Copyright (C) 2005 John Wiley & Sons, Ltd.
引用
收藏
页码:1059 / 1067
页数:9
相关论文
共 48 条
[1]  
*ASTM INT, 2004, E67303 ASTM INT
[2]  
BAMBYNEK W, 1984, P INT C XRAY INN SHE
[3]   NEW TECHNIQUE FOR INVESTIGATION OF ANGULAR-DISTRIBUTION OF PHOTOEMISSION FROM SOLIDS - DEMONSTRATION OF THE EFFECT OF ELASTIC-SCATTERING [J].
BASCHENKO, OA ;
MACHAVARIANI, GV ;
NEFEDOV, VI .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1984, 34 (03) :305-308
[4]   ANALYTICAL EXPRESSIONS FOR POTENTIALS OF NEUTRAL THOMAS-FERMI-DIRAC ATOMS AND FOR CORRESPONDING ATOMIC SCATTERING FACTORS FOR X RAYS AND ELECTRONS [J].
BONHAM, RA ;
STRAND, TG .
JOURNAL OF CHEMICAL PHYSICS, 1963, 39 (09) :2200-&
[5]   LE RENDEMENT DE FLUORESCENCE [J].
BURHOP, EHS .
JOURNAL DE PHYSIQUE ET LE RADIUM, 1955, 16 (07) :625-629
[6]  
CASNATI E, 1982, J PHYS B-AT MOL OPT, V15, P155, DOI 10.1088/0022-3700/15/1/022
[7]  
Coghlan W. A., 1973, Atomic Data, V5, P317, DOI 10.1016/S0092-640X(73)80005-1
[8]   ANGLE-RESOLVED XPS AND AES - DEPTH-RESOLUTION LIMITS AND A GENERAL COMPARISON OF PROPERTIES OF DEPTH-PROFILE RECONSTRUCTION METHODS [J].
CUMPSON, PJ .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1995, 73 (01) :25-52
[9]  
Edwards D.F., 1985, Handbook of optical constants of solids
[10]   TAKE-OFF ANGLE AND FILM THICKNESS DEPENDENCES OF THE ATTENUATION LENGTH OF X-RAY PHOTOELECTRONS BY A TRAJECTORY REVERSAL METHOD [J].
GRIES, WH ;
WERNER, W .
SURFACE AND INTERFACE ANALYSIS, 1990, 16 (1-12) :149-153