Oxygen plasma etching of YAG crystals

被引：1

作者：

Abromavicius, Giedrius ^{[1
]}

Kyzas, Naglis ^{[1
]}

Belosludtsev, Alexandr ^{[1
]}

机构：

[1] Ctr Phys Sci & Technol, Opt Coating Lab, Savanoriu Ave 231, LT-02300 Vilnius, Lithuania

来源：

ADVANCES IN OPTICAL THIN FILMS VI | 2018年 / 10691卷

关键词：

oxygen plasma; etching; YAG crystal; surface modification;

D O I：

10.1117/12.2314456

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

High surface quality of the optical elements is one of the key factors enabling their effective application in high power laser systems. In our work, commercially polished undoped YAG crystals were etched using low energy oxygen plasma. Surface roughness and optical properties were investigated using two different etching depths. Obtained results demonstrate smoothing of initial crystal surface and 1-4 % decrease of transmittance within UV-VIS spectral range.

引用

页数：5

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