Oxidation kinetics of an AlCuFeCr approximant compound: an ellipsometric study

被引:9
作者
Bonhomme, G
LeMieux, A
Weisbecker, P
Tsukruk, VV
Dubois, JM
机构
[1] Ecole Mines, CNRS, INPL, Lab Sci & Genie Mat & Met,UMR 7584, F-54042 Nancy, France
[2] Iowa State Univ Sci & Technol, Dept Mat Sci & Engn, Ames, IA 50011 USA
关键词
D O I
10.1016/j.jnoncrysol.2003.12.036
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Using single wavelength laser ellipsometry (lambda = 634 nm), we have studied the oxidation kinetics of bulk polycrystalline samples of an AlCuFeCr orthorhombic approximant compound of the decagonal phase. Up to 300 degreesC in dry air, nearly no evolution of the ellipsometric characteristics was detected, which can be explained assuming that the growth of the oxide layer stops shortly after beginning the exposure to temperature and air. Above this temperature, the changes of the ellipsometric characteristics pointed out a higher oxidation rate and a continuous growth of the oxide layer. In boiling water, we found that the kinetics of oxidation were as fast as when above 300 degreesC in dry air. Taking also into account atomic force microscopy measurements of the surface roughness, plausible scenarios for the oxidation process are inferred from our data. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:532 / 539
页数:8
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