Fabrication of metallic nanocones by induced deposition of etch masks and ion milling

被引：21

作者：

Fleischer, M. ^{[1
]}

Weber-Bargioni, A. ^{[2
]}

Cabrini, S. ^{[2
]}

Kern, D. P. ^{[1
]}

机构：

[1] Univ Tubingen, Inst Appl Phys, D-72076 Tubingen, Germany

[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Mol Foundry, Berkeley, CA 94720 USA

来源：

MICROELECTRONIC ENGINEERING | 2011年 / 88卷 / 08期

关键词：

Nanocone; Cone; Gold; Optical antenna; Electron beam induced deposition; Ion milling;

D O I：

10.1016/j.mee.2011.02.090

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A versatile process for the fabrication of metallic nanocones is presented that is applicable to different surface topographies. The process is based on thin-film metallization, focused electron beam induced deposition of local etch masks, and argon ion milling. Nanocones can be crafted from different metals. Examples are shown for the optimization of the process for gold nanocones of different sizes. With this process, individual cones can be positioned on both planar and non-planar surfaces. It therefore enables integration of sharp-tipped nanocones into extreme topographies. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：2247 / 2250

页数：4

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