Characterization of e-beam evaporated Ge, YbF3, ZnS, and LaF3 thin films for laser-oriented coatings

被引：148

作者：

Amotchkina, Tatiana, V ^{[1
]}

Trubetskov, Michael K. ^{[2
]}

Hahner, Daniel ^{[1
]}

Pervak, Volodymyr ^{[1
]}

机构：

[1] Ludwig Maximilians Univ Munchen, Coulombwall 1, D-85748 Garching, Germany

[2] Max Planck Inst Quantum Opt, Hans Kopfermann Str 1, D-85748 Garching, Germany

来源：

APPLIED OPTICS | 2020年 / 59卷 / 05期

关键词：

REFRACTIVE-INDEX; RELIABLE CHARACTERIZATION; OPTICAL-CONSTANTS; MU-M; TEMPERATURE; WAVELENGTH; GERMANIUM; PULSES; MGF2;

D O I：

10.1364/AO.59.000A40

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Thin films of Ge, ZnS, YbF3, and LaF3 produced using e-beam evaporation on ZnSe andGe substrateswere characterized in the range of 0.4-12 mu m. It was found that the Sellmeier model provides the best fit for refractive indices of ZnSe substrate, ZnS, and LaF3 films; the Cauchy model provides the best fit for YbF3 film. Optical constants of Ge substrate and Ge film as well as extinction coefficients of ZnS, YbF3, LaF3, and ZnSe substrate are presented in the frame of a non-parametric model. For the extinction coefficient of ZnS, the exponential model is applicable. Stresses in Ge, ZnS, YbF3, and LaF3 were estimated equal to (-50) MPa, (-400) MPa, 140 MPa, and 380 MPa, respectively. The surface roughness does not exceed 5 nm for all films and substrates. (C) 2019 Optical Society of America

引用

页码：A40 / A47

页数：8

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