Planar patterned magnetic media obtained by ion irradiation

被引：719

作者：

Chappert, C ^{[1
]}

Bernas, H

Ferré, J

Kottler, V

Jamet, JP

Chen, Y

Cambril, E

Devolder, T

Rousseaux, F

Mathet, V

Launois, H

机构：

[1] Univ Paris Sud, Inst Elect Fondamentale, CNRS, Unite Rech Associee 022, F-91405 Orsay, France

[2] Univ Paris Sud, Ctr Spectrometrie Nucl & Spectrometrie Masse, CNRS, Unite Propre Rech 6412, F-91405 Orsay, France

[3] Univ Paris Sud, Phys Solides Lab, CNRS, Unite Rech Associee 02, F-91405 Orsay, France

[4] Microstruct & Microelect Lab, CNRS, Unite Propre Rech 020, F-92225 Bagneux, France

来源：

SCIENCE | 1998年 / 280卷 / 5371期

关键词：

D O I：

10.1126/science.280.5371.1919

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

By ion irradiation through a lithographically made resist mask, the magnetic properties of cobalt-platinum simple sandwiches and multilayers were patterned without affecting their roughness and optical properties. This was demonstrated on arrays of 1-micrometer lines by near- and far-field magnetooptical microscopy, The coercive force and magnetic anisotropy of the irradiated regions can be accurately controlled by the irradiation fluence. If combined with high-resolution lithography, this technique holds promise for ultrahigh-density magnetic recording applications.

引用

页码：1919 / 1922

页数：4

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