A theoretical framework to obtain interface's shapes during the high-temperature annealing of high-aspect-ratio gratings

被引:7
作者
Castez, Marcos F. [1 ]
Salvarezza, Roberto C. [1 ]
Nakamura, Jun [2 ]
Sudoh, Koichi [2 ]
机构
[1] Natl Univ La Plata, CONICET, INIFTA, RA-1900 La Plata, Argentina
[2] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
关键词
annealing; interface structure; silicon; surface diffusion; surface morphology; SURFACE; HYDROGEN; TRANSFORMATION; MORPHOLOGY; EVOLUTION;
D O I
10.1063/1.3492442
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-temperature annealing applied to solid samples produces important morphological modifications on their surfaces, particularly in high-aspect-ratio gratings. We show, how by means of a framework based in a nonlinear analysis of the Mullins' equation [J. Appl. Phys. 28, 333 (1957)], we can mathematically reproduce surface's shapes just by measuring a few characteristic features of the interfaces (essentially pattern's amplitudes and wavelengths). We compared our results with experimental data on silicon samples, finding a close agreement between experimental shapes and those theoretically predicted. The introduced framework could be particularly useful in those situations where no cross-sectional information were available. (C) 2010 American Institute of Physics. [doi:10.1063/1.3492442]
引用
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页数:3
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