A 512x8 electrical fuse memory with 15 μm2 cells using 8-sq asymmetric fuse and core devices in 90nm CMOS

被引:4
作者
Chung, Shine. [1 ]
Huang, Jiann-Tseng [1 ]
Chen, Paul [1 ]
Hsueh, Fu-Lung [1 ]
机构
[1] Taiwan Semicond Mfg Corp Ltd, Hsinchu 30077, Taiwan
来源
2007 Symposium on VLSI Circuits, Digest of Technical Papers | 2007年
关键词
D O I
10.1109/VLSIC.2007.4342771
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A 15 mu m(2) cell 4Kb electrical fuse memory is designed in 90nm CMOS using core devices only. The N+ 8-sq asymmetric fuses are used to enhance fuse uniformity, reliability and aggregate electro-migration. High-gain cascade amplifiers sense small resistance differences to achieve a 2.25V program voltage in 1 mu s. A sufficient design window is derived and verified by using on-chip resistance monitor without area overheads.
引用
收藏
页码:74 / 75
页数:2
相关论文
共 2 条
[1]   A PROM element based on salicide agglomeration of poly fuses in a CMOS logic process [J].
Alavi, M ;
Bohr, M ;
Hicks, J ;
Denham, M ;
Cassens, A ;
Douglas, D ;
Tsai, MC .
INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, :855-858
[2]   Electrically programmable fuse (eFUSE) using electromigration in silicides [J].
Kothandaraman, C ;
Iyer, SK ;
Iyer, SS .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (09) :523-525