Dry transfer of CVD graphene using MoS2-based stamps

被引:7
作者
Banszerus, Luca [1 ,2 ]
Watanabe, Kenji [3 ]
Taniguchi, Takashi [3 ]
Beschoten, Bernd [1 ,2 ]
Stampfer, Christoph [1 ,2 ,4 ]
机构
[1] Rhein Westfal TH Aachen, JARA FIT, D-52074 Aachen, Germany
[2] Rhein Westfal TH Aachen, Inst Phys 2, D-52074 Aachen, Germany
[3] Natl Inst Mat Sci, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan
[4] Forschungszentrum Julich, Peter Grunberg Inst PGI 9, D-52425 Julich, Germany
来源
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2017年 / 11卷 / 07期
关键词
charge carrier mobility; chemical vapor deposition; dry transfer; graphene; MoS2; RAMAN-SPECTROSCOPY; HIGH-QUALITY; STRAIN; FILMS; MOS2;
D O I
10.1002/pssr.201700136
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Recently, a contamination-free dry transfer method for graphene grown by chemical vapor deposition (CVD) has been reported that allows to directly pick-up graphene from the copper growth substrate using a flake of hexagonal boron nitride (hBN), resulting in ultrahigh charge carrier mobility and low overall doping. Here, we report that not only hBN, but also flakes of molybdenum disulfide (MoS2) can be used to dry transfer graphene. This, on one hand, allows for the fabrication of complex van-der-Waals heterostructures using CVD graphene combined with different two-dimensional materials and, on the other hand, can be a route toward a scalable dry transfer of CVD graphene. The resulting heterostructures are studied using low temperature transport measurements revealing a strong charge carrier density dependence of the carrier mobilities (up to values of 12,000 cm(2)/(Vs)) and the residual charge carrier density fluctuations near the charge neutrality point when changing the carrier density in the MoS2 by applying a top gate voltage. (C) 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页数:5
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