Bipolar conduction impact on electrical characteristics and reliability of 1.2-and 3.5-kV 4H-SiC JBS diodes

被引:28
|
作者
Brosselard, Pierre [1 ]
Camara, Nicolas [1 ]
Banu, Viorel [1 ]
Jorda, Xavier [1 ]
Vellvehi, Miquel [1 ]
Godignon, Philippe [1 ]
Millan, Jose [1 ]
机构
[1] Univ Autonoma Barcelona, Ctr Nacl Microelect, Inst Microelect, Barcelona Consejo Super Invest Cient, E-08193 Barcelona, Spain
关键词
Junction Barrier Schottky (JBS); merged p-i-n Schottky; rectifier; reverse recovery; Schottky; silicon carbide (SiC); surge current; ultrafast diodes;
D O I
10.1109/TED.2008.926636
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
4H-SiC Junction Barrier Schottky (JBS) diodes (1.2 and 3.5 kV) have been processed using the same technology with two different layouts. From 4 A and for the whole temperature range, the 3.5-kV diodes exhibit a bipolar conduction independent of the layout. However, the behavior of the 1.2-kV diodes depends on the design. At 500 V-300 'C, the leakage current is only 100 nA and 10 /-tA for the 3.5- and 1.2-kV diodes, respectively. The switch-off performances show a reverse peak current of only 50% of the nominal current at 300 'C for all JBS diodes. The JBS diodes have a surge current capability of around 80 A, two times higher than the Schottky diodes. DC electrical stresses are performed during 50 h, and all the 1.2-kV diodes exhibit no bipolar degradation. Nevertheless, some slight bipolar degradation is observed in 3.5-kV JBS diodes. Electroluminescence measurements exhibit the expansion of stacking faults in 3.5-kV diodes unlike in 1.2-kV diodes.
引用
收藏
页码:1847 / 1856
页数:10
相关论文
共 39 条
  • [1] 1.2-kV 4H-SiC JBS Diodes Engaging P-Type Retrograde Implants
    Zhang, Yuan-Lan
    Liu, Peng-Fei
    Zhang, Jie
    Ma, Hong-Ping
    Liu, Jian-Hua
    Liu, Qi-Bin
    Chen, Zhong-Guo
    Zhang, Qingchun J.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 69 (12) : 6963 - 6970
  • [2] 1500 V, 4 amp 4H-SiC JBS diodes
    Singh, R
    Ryu, SH
    Palmour, JW
    Hefner, AR
    Lai, JS
    12TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES & ICS - PROCEEDINGS, 2000, : 101 - 104
  • [3] Impact of proton irradiation on the static and dynamic characteristics of high-voltage 4H-SiC JBS switching diodes
    Luo, ZZ
    Chen, TB
    Cressler, JD
    Sheridan, D
    Williams, JR
    Reed, RA
    Marshall, PW
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2003, 50 (06) : 1821 - 1826
  • [4] Study of 4H-SiC JBS Diodes Fabricated with Tungsten Schottky Barrier
    Berthou, M.
    Godignon, P.
    Montserrat, J.
    Millan, J.
    Planson, D.
    JOURNAL OF ELECTRONIC MATERIALS, 2011, 40 (12) : 2355 - 2362
  • [5] Study of 4H-SiC JBS Diodes Fabricated with Tungsten Schottky Barrier
    M. Berthou
    P. Godignon
    J. Montserrat
    J. Millan
    D. Planson
    Journal of Electronic Materials, 2011, 40 : 2355 - 2362
  • [6] 1.2-kV Low-Barrier 4H-SiC JBS Diodes by Virtue of P-Implants Across Dead Field of Current Flow
    Zhang, Yuan-Lan
    Liu, Pan
    Lei, Guang-Yin
    Zhang, Qingchun J.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2023, 70 (08) : 4293 - 4302
  • [7] The Impact of the Hexagonal and Circular Cell Designs on the Characteristics and Ruggedness for 4H-SiC MPS Diodes
    Liu, Li
    Wu, Jiupeng
    Xu, Hongyi
    Zhu, Zhengyun
    Ren, Na
    Guo, Qing
    Zhang, Junming
    Sheng, Kuang
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 69 (03) : 1226 - 1232
  • [8] Development of 3.6 kV 4H-SiC PiN Power Diodes
    Zou, Xiao
    Yue, Ruifeng
    Wang, Yan
    2017 INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC), 2017,
  • [9] Dynamic Electrical Characteristics of 4H-SiC Drift Step Recovery Diodes of High Voltage
    Yang, Zewei
    Liang, Lin
    Yan, Xiaoxue
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2022, 50 (05) : 1276 - 1281
  • [10] Single and repetitive surge current events of 3.3 kV-20 A 4H-SiC JBS rectifiers: the impact of the anode layout
    Donato, Nazareno
    Udrea, Florin
    Mihaila, Andrei
    Knoll, Lara
    Romano, Gianpaolo
    Kranz, Lukas
    Antoniou, Marina
    PROCEEDINGS OF THE 2020 32ND INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD 2020), 2020, : 198 - 201