A Plasma Lens for Magnetron Sputtering

被引：14

作者：

Anders, Andre ^{[1
]}

Brown, Jeff ^{[2
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

[2] Acree Technol Inc, Concord, CA 94520 USA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2011年 / 39卷 / 11期

关键词：

Plasma devices; plasma materials processing; plasma transport processes; sputtering; thin films;

D O I：

10.1109/TPS.2011.2157172

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A plasma lens, consisting of a solenoid and potential-defining ring electrodes, has been placed between a magnetron and substrates to be coated. Photography reveals qualitative information on excitation, ionization, and the transport of plasma to the substrate.

引用

页码：2528 / 2529

页数：2

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