Low-temperature growth of SnOx thin films using reactive ion-assisted deposition

被引：3
|
作者：
Cho, JS [1 ]
Song, SK [1 ]
Jung, HJ [1 ]
Koh, SK [1 ]
Choi, WK [1 ]
Yoon, KH [1 ]
机构：
[1] YONSEI UNIV, DEPT CERAM ENGN, SUDAEMOON GU, SEOUL 120749, SOUTH KOREA
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1997年 / 16卷 / 07期
关键词：
D O I：
10.1023/A:1018545217200
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：524 / 527
页数：4
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