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Position-Controlled Growth of GaN Nanowires and Nanotubes on Diamond by Molecular Beam Epitaxy
被引:73
作者:

Schuster, Fabian
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Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Tech Univ Munich, Dept Phys, D-85748 Garching, Germany Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

Hetzl, Martin
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机构:
Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Tech Univ Munich, Dept Phys, D-85748 Garching, Germany Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

Weiszer, Saskia
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h-index: 0
机构:
Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Tech Univ Munich, Dept Phys, D-85748 Garching, Germany Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

Garrido, Jose A.
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Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Tech Univ Munich, Dept Phys, D-85748 Garching, Germany Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

de la Mata, Maria
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ICMAB CSIC, Inst Ciencia Mat Barcelona, Bellaterra 08193, Catalonia, Spain Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

Magen, Cesar
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Zaragoza, LMA, INA ARAID, Zaragoza 50018, Spain
Univ Zaragoza, Dept Fis Mat Condensada, Zaragoza 50018, Spain Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

Arbiol, Jordi
论文数: 0 引用数: 0
h-index: 0
机构:
ICREA, Inst Catalana Rec & Estudis Avancats, Barcelona 08010, Catalonia, Spain
CELLS ALBA Synchrotron Light Facil, Cerdanyola Del Valles 08290, Catalonia, Spain
Inst Catala Nanociencia & Nanotecnol ICN2, Bellaterra 08193, Catalonia, Spain Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany

Stutzmann, Martin
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h-index: 0
机构:
Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
Tech Univ Munich, Dept Phys, D-85748 Garching, Germany Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
机构:
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[2] Tech Univ Munich, Dept Phys, D-85748 Garching, Germany
[3] ICMAB CSIC, Inst Ciencia Mat Barcelona, Bellaterra 08193, Catalonia, Spain
[4] Univ Zaragoza, LMA, INA ARAID, Zaragoza 50018, Spain
[5] Univ Zaragoza, Dept Fis Mat Condensada, Zaragoza 50018, Spain
[6] ICREA, Inst Catalana Rec & Estudis Avancats, Barcelona 08010, Catalonia, Spain
[7] CELLS ALBA Synchrotron Light Facil, Cerdanyola Del Valles 08290, Catalonia, Spain
[8] Inst Catala Nanociencia & Nanotecnol ICN2, Bellaterra 08193, Catalonia, Spain
关键词:
Nanowires;
GaN;
Selective area growth;
molecular beam epitaxy;
proximity effects;
polarity;
POLARITY;
NANOCOLUMNS;
NUCLEATION;
GAAS;
ZNO;
D O I:
10.1021/nl504446r
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
In this work the position-controlled growth of GaN nariowires (NW-s) on diamond by means of molecular beam epitaxy is investigated. In terms of growth, diamond can he seen as a model substrate, providing information of systematic relevance also for other substrates. Thin Ti masks ate structured by electron beam-lithography which,allows the fabrication of perfectly homogeneous-GaN NW arrays with different diameters and distances. While the wurtzite NWS are found to be Ga-polar, N-polar nucleation leads to the forrmation of tripod structures with a zinc-blende core which can be efficiently suppressed above a substrate temperature of 870 degrees C. A variation of the III/V flux ratio reveals that both axial and radial growth rates are N-limited despite the globally N-rich growth conditions, which is explained by the different diffusion behavior of Ga and N atoms. Furthermore, it is shown that the hole arrangement has no effect on the selectivity but can be used to force a transition from nano-wire to nanotube growth by employing a highly competitive growth regime.
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收藏
页码:1773 / 1779
页数:7
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