Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

被引：4

作者：

Yu, Zhaoning ^{[1
]}

Hwu, Justin ^{[1
]}

Liu, Yongdong ^{[1
]}

Su, Zhenpeng ^{[1
]}

Yang, Henry ^{[1
]}

Wang, Hongying ^{[1
]}

Hu, Wei ^{[1
]}

Xu, Yuan ^{[1
]}

Kurataka, Nobuo ^{[1
]}

Hsu, Yautzong ^{[1
]}

Lee, Shifu ^{[1
]}

Gauzner, Gene ^{[1
]}

机构：

[1] Seagate Technol, Recording Media Operat, Fremont, CA 94538 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 06期

关键词：

SCATTEROMETRY; LITHOGRAPHY; FABRICATION; GRATINGS;

D O I：

10.1116/1.3507888

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The authors have applied spectroscopic ellipsometry optical critical dimension (SE-OCD) measurement to grating templates and imprinted resist patterns with a pitch of 72.6 nm, corresponding to a track density of 350 ktpi (kilotracks per inch) for discreet track recording media. Their experiments indicate that SE-OCD is sensitive in detecting topography features in template profiles. The measurement of imprinted resist pattern is complicated by parameter correlation. Comparison of SE-OCD reported template and imprinted resist profiles can be used to study imprint pattern fidelity. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3507888]

引用

页码：C6M130 / C6M135

页数：6

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