Low loss waveguide in Nd3+-doped silicate glass fabricated by carbon ion implantation

被引：1

作者：

Li, SL

Wang, KM ^{[1
]}

Chen, F

Wang, XL

Fu, G

Lu, QM

Hu, LL

Shen, DY

Ma, HJ

Nie, R

机构：

[1] Shandong Univ, Sch Phys & Microelect, Jinan 250100, Shandong, Peoples R China

[2] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Shandong, Peoples R China

[3] Shandong Univ, Sch Chem & Chem Engn, Jinan 250100, Shandong, Peoples R China

[4] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China

[5] Peking Univ, Minist Educ, Dept Tech Phys, Beijing 100871, Peoples R China

[6] Peking Univ, Minist Educ, Key Lab Heavy Ions Phys, Beijing 100871, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2005年 / 200卷 / 1-4期

基金：

中国国家自然科学基金;

关键词：

ion implantation; planar waveguide; Nd3+-doped silicate glass; propagation loss;

D O I：

10.1016/j.surfcoat.2005.02.144

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Low loss index enhanced planar waveguides in Nd3+-doped silicate glass were fabricated by 3.0 MeV C+ ion implantation. The enhancement of the refractive index confined the light propagating in the waveguide. The prism-coupling method was used to measure dark modes in the waveguide. The effective refractive indices of the waveguide were obtained based on the dark modes. The moving fiber method was applied to measure the waveguide propagation loss. Loss measured in non-annealed samples is about 0.6 dB/cm. And the waveguide mode optical near-field output at 633 nm was presented. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：598 / 601

页数：4

共 10 条

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