Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

被引：281
作者：
Heister, K
Zharnikov, M
Grunze, M
Johansson, LSO
Ulman, A
机构：
[1] Univ Heidelberg, D-62120 Heidelberg, Germany
[2] Karlstad Univ, Dept Phys, S-65188 Karlstad, Sweden
[3] Polytech Univ, Dept Chem, Brooklyn, NY 11201 USA
[4] NSF MRSEC Polymers Engn Interfaces, Brooklyn, NY 11201 USA
来源：
LANGMUIR | 2001年 / 17卷 / 01期
关键词：
D O I：
10.1021/la001101d
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Synchrotron-based high-resolution X-ray. photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.
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页码：8 / 11
页数：4
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