共 50 条
- [1] Compressing MEBES data enabling multi-threaded decompression - art. no. 67303I PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : I7303 - I7303
- [2] Pellicle dimensions for high NA photomasks - art. no. 67303Y PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : Y7303 - Y7303
- [3] Effective area partitioning for preparing parallel processing in mask data preparation - art. no. 67304C PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : C7304 - C7304
- [4] Calibration of contact areas: the influence of corner rounding - art. no. 67303B PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : B7303 - B7303
- [5] Determine OPC target specifications electrically instead of geometrically - art. no. 67303V PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : V7303 - V7303
- [6] Preliminary verifiability of the aerial image measurement tool over photolithography process - art. no. 67303A PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : A7303 - A7303
- [8] Mask industry assessment trend analysis 20064 - art. no. 653303 EMLC 2007: 23rd European Mask and Lithography Conference, 2007, 6533 : 53303 - 53303
- [9] Application of modified jog-fill DRC rule on LFD OPC flow - art. no. 67303W PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730 : W7303 - W7303