Fabrication of three-dimensional photonic crystals with multi-layer photolithography

被引：2

作者：

Yao, P ^{[1
]}

Schneider, GJ ^{[1
]}

Miao, BL ^{[1
]}

Prather, DW ^{[1
]}

Wetzel, ED ^{[1
]}

O'Brien, DJ ^{[1
]}

机构：

[1] Univ Delaware, Dept Elect Engn, Newark, DE 19716 USA

来源：

Micromachining Technology for Micro-Optics and Nano-Optics III | 2005年 / 5720卷

关键词：

INFRARED WAVELENGTHS; BANDGAP CRYSTALS; LITHOGRAPHY;

D O I：

10.1117/12.589139

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have developed a new approach for the fabrication of three-dimensional photonic crystals based on multi-layer photolithography. This method, which uses commercially available photoresist, allows parallel fabrication of three-dimensional photonic crystals, and possesses the flexibility to create a variety of different lattice arrangements and the freedom of arbitrary defect introduction. We describe in this work how this method is derived from mature two-dimensional photolithography and demonstrate it with the fabrication of multi-layer woodpile structures with and without defects as well as other unique three-dimensional microstructures.

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页码：27 / 35

页数：9

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