Multi-layer thin-film deposition for high-performance X-ray field-emission characteristics

被引：0
|
作者：
Jang, Tae Hwan [1 ]
Kim, Tae Gyu [1 ]
Bae, Mun Ki [2 ]
Kim, Kyuseok [3 ]
Choi, Jaegu [3 ]
机构：
[1] Pusan Natl Univ, Dept Nanomechatron Engn, Busan 46241, South Korea
[2] Pusan Natl Univ, Dept Nanofus Technol, Miryang 50463, Gyeongnam, South Korea
[3] Korea Elect Res Inst KERI, Electromed Device Res Ctr, Chang Won 15588, South Korea
来源：
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2021年 / 35卷 / 14N16期
关键词：
Field emission; DLC; multi-layer thin-film emitter;
D O I：
10.1142/S0217979221400439
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
In this study, we developed a nanoscale emitter having a multi-layer thin-film nanostructure in an effort to maximize the field-emission effect with a low voltage difference. The emitter was a sapphire board on which tungsten-DLC multi-player thin film was deposited using PVD and CVD processes. This multi-layer thin-film emitter was examined in a high-vacuum X-ray tube system. Its field-emission efficiency according to the applied voltage was then analyzed.
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页数：5
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