Study of the excitation mechanisms of the second positive system in the negative glow of a N2-Ar discharge

被引:12
作者
Isola, L. [1 ]
Lopez, M. [1 ]
Gomez, B. J. [1 ]
机构
[1] Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina
关键词
NEUTRAL GAS TEMPERATURE; METASTABLE ARGON ATOMS; COEFFICIENTS; RELAXATION; PROPENSITY; MOLECULES; NITROGEN; AR(3P2); N2; RF;
D O I
10.1088/0022-3727/44/37/375204
中图分类号
O59 [应用物理学];
学科分类号
摘要
In an Ar-N-2 discharge, the high excitation transfer from Ar(P-3(2,0)) to N-2 produces an overpopulation of the high rotational levels of the bands of the second positive system (SPS), and so the spectra interpretation is not straightforward. This paper presents a fit function for the SPS bands measured in Ar-N-2, which allows us to study the excitation process contributions to the N-2(C) level. The procedure was tested in the negative glow of a pulsed Ar-N-2 discharge at a pressure of 2.5 Torr, for different mixture concentrations. In this discharge, through the fitting, it was possible to calculate the variation of the N-2(C) densities produced by different excitation processes as well as the variation of Ar metastable density.
引用
收藏
页数:7
相关论文
共 25 条
  • [1] Gas temperature and electron density profiles in an argon dc microdischarge measured by optical emission spectroscopy
    Belostotskiy, Sergey G.
    Ouk, Tola
    Donnelly, Vincent M.
    Economou, Demetre J.
    Sadeghi, Nader
    [J]. JOURNAL OF APPLIED PHYSICS, 2010, 107 (05)
  • [2] Comprehensive modelling network for dc glow discharges in argon
    Bogaerts, A
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (02) : 210 - 229
  • [3] Study on the influence of nitrogen on titanium nitride in a dc post magnetron sputtering plasma system
    Borah, Sankar Moni
    Bailung, Heremba
    Pal, Arup Ratan
    Chutia, Joyanti
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (19)
  • [4] Determination of the vibrational, rotational and electron temperatures in N2 and Ar-N2 rf discharge
    Britun, N.
    Gaillard, M.
    Ricard, A.
    Kim, Y. M.
    Kim, K. S.
    Han, J. G.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (04) : 1022 - 1029
  • [5] Electronic quenching of OH(A) by water in atmospheric pressure plasmas and its influence on the gas temperature determination by OH(A-X) emission
    Bruggeman, Peter
    Iza, Felipe
    Guns, Peter
    Lauwers, Daniel
    Kong, Michael G.
    Gonzalvo, Yolanda Aranda
    Leys, Christophe
    Schram, Daan C.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (01)
  • [6] Analysis of DC magnetron discharges in Ar-N2 gas mixtures.: Comparison of a collisional-radiative model with optical emission spectroscopy
    Debal, F
    Bretagne, J
    Jumet, M
    Wautelet, M
    Dauchot, JP
    Hecq, M
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) : 219 - 229
  • [7] SYMMETRIES, PROPENSITY RULES, AND ALTERNATION INTENSITY IN THE ROTATIONAL SPECTRUM OF N2(C3-PI-U) EXCITED BY METASTABLES AR(3P0,2)
    DEROUARD, J
    NGUYEN, TD
    SADEGHI, N
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1980, 72 (12) : 6698 - 6705
  • [8] OODR-LIF direct measurement of N2(C 3Πu, v=0-4) electronic quenching and vibrational relaxation rate coefficients by N2 collision
    Dilecce, G.
    Ambrico, P. F.
    De Benedictis, S.
    [J]. CHEMICAL PHYSICS LETTERS, 2006, 431 (4-6) : 241 - 246
  • [9] Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films
    Duquenne, C.
    Tessier, P. Y.
    Besland, M. P.
    Angleraud, B.
    Jouan, P. Y.
    Aubry, R.
    Delage, S.
    Djouadi, M. A.
    [J]. JOURNAL OF APPLIED PHYSICS, 2008, 104 (06)
  • [10] FRANCK-CONDON FACTORS, R-CENTROIDS, ELECTRONIC-TRANSITION MOMENTS, AND EINSTEIN COEFFICIENTS FOR MANY NITROGEN AND OXYGEN BAND SYSTEMS
    GILMORE, FR
    LAHER, RR
    ESPY, PJ
    [J]. JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (05) : 1005 - 1107