共 25 条
Study of the excitation mechanisms of the second positive system in the negative glow of a N2-Ar discharge
被引:12
作者:

Isola, L.
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina

Lopez, M.
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina

Gomez, B. J.
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina
机构:
[1] Inst Fis Rosario CONICET UNR, Rosario, Santa Fe, Argentina
关键词:
NEUTRAL GAS TEMPERATURE;
METASTABLE ARGON ATOMS;
COEFFICIENTS;
RELAXATION;
PROPENSITY;
MOLECULES;
NITROGEN;
AR(3P2);
N2;
RF;
D O I:
10.1088/0022-3727/44/37/375204
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In an Ar-N-2 discharge, the high excitation transfer from Ar(P-3(2,0)) to N-2 produces an overpopulation of the high rotational levels of the bands of the second positive system (SPS), and so the spectra interpretation is not straightforward. This paper presents a fit function for the SPS bands measured in Ar-N-2, which allows us to study the excitation process contributions to the N-2(C) level. The procedure was tested in the negative glow of a pulsed Ar-N-2 discharge at a pressure of 2.5 Torr, for different mixture concentrations. In this discharge, through the fitting, it was possible to calculate the variation of the N-2(C) densities produced by different excitation processes as well as the variation of Ar metastable density.
引用
收藏
页数:7
相关论文
共 25 条
- [1] Gas temperature and electron density profiles in an argon dc microdischarge measured by optical emission spectroscopy[J]. JOURNAL OF APPLIED PHYSICS, 2010, 107 (05)Belostotskiy, Sergey G.论文数: 0 引用数: 0 h-index: 0机构: Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USA Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USAOuk, Tola论文数: 0 引用数: 0 h-index: 0机构: Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USA Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USADonnelly, Vincent M.论文数: 0 引用数: 0 h-index: 0机构: Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USA Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USAEconomou, Demetre J.论文数: 0 引用数: 0 h-index: 0机构: Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USA Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USASadeghi, Nader论文数: 0 引用数: 0 h-index: 0机构: Univ Grenoble 1, UMR C5588, Spectrometrie Phys Lab, F-38402 St Martin Dheres, France Ecole Natl Super Electrochim & Electrome Grenoble, Thermodynam & Physicochim Met Lab, CNRS, F-38402 St Martin Dheres, France Univ Houston, Plasma Proc Lab, Dept Chem & Biomol Engn, Houston, TX 77204 USA
- [2] Comprehensive modelling network for dc glow discharges in argon[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (02) : 210 - 229Bogaerts, A论文数: 0 引用数: 0 h-index: 0机构: Univ Instelling Antwerp, Dept Chem, B-2610 Antwerp, Belgium Univ Instelling Antwerp, Dept Chem, B-2610 Antwerp, Belgium
- [3] Study on the influence of nitrogen on titanium nitride in a dc post magnetron sputtering plasma system[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (19)Borah, Sankar Moni论文数: 0 引用数: 0 h-index: 0机构: Inst Adv Study Sci & Technol, Plasma Phys Lab, Div Mat Sci, Gauhati 781035, Assam, India Inst Adv Study Sci & Technol, Plasma Phys Lab, Div Mat Sci, Gauhati 781035, Assam, IndiaBailung, Heremba论文数: 0 引用数: 0 h-index: 0机构: Inst Adv Study Sci & Technol, Plasma Phys Lab, Div Mat Sci, Gauhati 781035, Assam, India Inst Adv Study Sci & Technol, Plasma Phys Lab, Div Mat Sci, Gauhati 781035, Assam, India论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:
- [4] Determination of the vibrational, rotational and electron temperatures in N2 and Ar-N2 rf discharge[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (04) : 1022 - 1029Britun, N.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South KoreaGaillard, M.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South KoreaRicard, A.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South KoreaKim, Y. M.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South KoreaKim, K. S.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South KoreaHan, J. G.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea
- [5] Electronic quenching of OH(A) by water in atmospheric pressure plasmas and its influence on the gas temperature determination by OH(A-X) emission[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (01)论文数: 引用数: h-index:机构:Iza, Felipe论文数: 0 引用数: 0 h-index: 0机构: Univ Loughborough, Dept Elect & Elect Engn, Loughborough LE11 3TU, Leics, England Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, NetherlandsGuns, Peter论文数: 0 引用数: 0 h-index: 0机构: Univ Ghent, Dept Appl Phys, B-9000 Ghent, Belgium Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, NetherlandsLauwers, Daniel论文数: 0 引用数: 0 h-index: 0机构: Univ Ghent, Dept Appl Phys, B-9000 Ghent, Belgium Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, NetherlandsKong, Michael G.论文数: 0 引用数: 0 h-index: 0机构: Univ Loughborough, Dept Elect & Elect Engn, Loughborough LE11 3TU, Leics, England Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, NetherlandsGonzalvo, Yolanda Aranda论文数: 0 引用数: 0 h-index: 0机构: Hiden Analyt Ltd, Plasma & Surface Anal Div, Warrington WA5 7UN, Cheshire, England Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, NetherlandsLeys, Christophe论文数: 0 引用数: 0 h-index: 0机构: Univ Ghent, Dept Appl Phys, B-9000 Ghent, Belgium Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, NetherlandsSchram, Daan C.论文数: 0 引用数: 0 h-index: 0机构: Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands Tech Univ Eindhoven, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
- [6] Analysis of DC magnetron discharges in Ar-N2 gas mixtures.: Comparison of a collisional-radiative model with optical emission spectroscopy[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) : 219 - 229Debal, F论文数: 0 引用数: 0 h-index: 0机构: Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, BelgiumBretagne, J论文数: 0 引用数: 0 h-index: 0机构: Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, BelgiumJumet, M论文数: 0 引用数: 0 h-index: 0机构: Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, BelgiumWautelet, M论文数: 0 引用数: 0 h-index: 0机构: Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, BelgiumDauchot, JP论文数: 0 引用数: 0 h-index: 0机构: Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, BelgiumHecq, M论文数: 0 引用数: 0 h-index: 0机构: Univ Mons, Lab Chim Inorgan & Analyt, B-7000 Mons, Belgium
- [7] SYMMETRIES, PROPENSITY RULES, AND ALTERNATION INTENSITY IN THE ROTATIONAL SPECTRUM OF N2(C3-PI-U) EXCITED BY METASTABLES AR(3P0,2)[J]. JOURNAL OF CHEMICAL PHYSICS, 1980, 72 (12) : 6698 - 6705DEROUARD, J论文数: 0 引用数: 0 h-index: 0机构: Laboratoire de Spectrométrie Physique, Université Scientifique et Médicale de Grenoble, 38041 Grenoble CedexNGUYEN, TD论文数: 0 引用数: 0 h-index: 0机构: Laboratoire de Spectrométrie Physique, Université Scientifique et Médicale de Grenoble, 38041 Grenoble CedexSADEGHI, N论文数: 0 引用数: 0 h-index: 0机构: Laboratoire de Spectrométrie Physique, Université Scientifique et Médicale de Grenoble, 38041 Grenoble Cedex
- [8] OODR-LIF direct measurement of N2(C 3Πu, v=0-4) electronic quenching and vibrational relaxation rate coefficients by N2 collision[J]. CHEMICAL PHYSICS LETTERS, 2006, 431 (4-6) : 241 - 246Dilecce, G.论文数: 0 引用数: 0 h-index: 0机构: CNR, Inst Metodol Inorgan & Plasmi, Sede Bari, I-70126 Bari, Italy CNR, Inst Metodol Inorgan & Plasmi, Sede Bari, I-70126 Bari, ItalyAmbrico, P. F.论文数: 0 引用数: 0 h-index: 0机构: CNR, Inst Metodol Inorgan & Plasmi, Sede Bari, I-70126 Bari, Italy CNR, Inst Metodol Inorgan & Plasmi, Sede Bari, I-70126 Bari, ItalyDe Benedictis, S.论文数: 0 引用数: 0 h-index: 0机构: CNR, Inst Metodol Inorgan & Plasmi, Sede Bari, I-70126 Bari, Italy CNR, Inst Metodol Inorgan & Plasmi, Sede Bari, I-70126 Bari, Italy
- [9] Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films[J]. JOURNAL OF APPLIED PHYSICS, 2008, 104 (06)Duquenne, C.论文数: 0 引用数: 0 h-index: 0机构: Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceTessier, P. Y.论文数: 0 引用数: 0 h-index: 0机构: Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceBesland, M. P.论文数: 0 引用数: 0 h-index: 0机构: Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceAngleraud, B.论文数: 0 引用数: 0 h-index: 0机构: Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceJouan, P. Y.论文数: 0 引用数: 0 h-index: 0机构: Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceAubry, R.论文数: 0 引用数: 0 h-index: 0机构: Alcatel Alsthom Rech, Route Nozay, THALES Lab 3 5, F-91461 Marcoussis, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceDelage, S.论文数: 0 引用数: 0 h-index: 0机构: Alcatel Alsthom Rech, Route Nozay, THALES Lab 3 5, F-91461 Marcoussis, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, FranceDjouadi, M. A.论文数: 0 引用数: 0 h-index: 0机构: Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, UMR 6502, F-44322 Nantes 3, France
- [10] FRANCK-CONDON FACTORS, R-CENTROIDS, ELECTRONIC-TRANSITION MOMENTS, AND EINSTEIN COEFFICIENTS FOR MANY NITROGEN AND OXYGEN BAND SYSTEMS[J]. JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (05) : 1005 - 1107GILMORE, FR论文数: 0 引用数: 0 h-index: 0机构: Logicon RDA, Los Angeles, CA 90009LAHER, RR论文数: 0 引用数: 0 h-index: 0机构: Logicon RDA, Los Angeles, CA 90009ESPY, PJ论文数: 0 引用数: 0 h-index: 0机构: Logicon RDA, Los Angeles, CA 90009