Influence of H2 plasma treatment on field emission from diamond films

被引：0
作者：
Yuan, G [1 ]
Ji, H [1 ]
Han, L [1 ]
Zhao, HF [1 ]
Jiang, H [1 ]
Zhou, TM [1 ]
Wang, WB [1 ]
Wang, YZ [1 ]
Jin, CC [1 ]
Jin, YX [1 ]
机构：
[1] Chinese Acad Sci, Changchun Inst Phys, Changchun 130021, Peoples R China
来源：
DISPLAY DEVICES AND SYSTEMS II | 1998年 / 3560卷
关键词：
diamond films; NEA; field emission;
D O I：
10.1117/12.319669
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The field emission was obtained from hydrogen plasma treated diamond films. It is found that the emission increased and is not stable after hydrogen treatment. Atomic force microscopy (AFM) study shows that the surface morphology of the diamond films were changed after hydrogen treatment, but the effective work function is not reduced. These results were discussed.
引用
收藏
页码：168 / 170
页数：3
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