Interaction corrections to two-dimensional hole transport in the large-rs limit -: art. no. 165308

被引:66
作者
Noh, H [1 ]
Lilly, MP
Tsui, DC
Simmons, JA
Hwang, EH
Das Sarma, S
Pfeiffer, LN
West, KW
机构
[1] Princeton Univ, Dept Elect Engn, Princeton, NJ 08544 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
[3] Univ Maryland, Dept Phys, Condensed Matter Theory Ctr, College Pk, MD 20742 USA
[4] Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USA
关键词
D O I
10.1103/PhysRevB.68.165308
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The metallic conductivity of dilute two-dimensional holes in a GaAs heterojunction insulated-gate field-effect transistor with extremely high mobility and large r(s) is found to have a linear dependence on temperature, consistent with the theory of interaction corrections in the ballistic regime. Phonon scattering contributions are negligible in the temperature range of our interest, allowing comparison between our measured data and theory without any phonon subtraction. The magnitude of the Fermi liquid interaction parameter F-0(sigma) determined from the experiment, however, decreases with increasing r(s) for r(s)greater than or similar to22, a behavior unexpected from theoretical calculations valid for small r(s).
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