Composition control of Zn1-xMgxO thin films grown using mist chemical vapor deposition

被引：10

作者：

Rutthongjan, Phimolphan ^{[1
]}

Liu, Li ^{[1
]}

Nishi, Misaki ^{[2
]}

Sakamoto, Masahito ^{[2
]}

Sato, Shota ^{[1
]}

Pradeep, Ellawala K. C. ^{[3
]}

Dang, Giang T. ^{[3
]}

Kawaharamura, Toshiyuki ^{[1
,2
,3
]}

机构：

[1] Kochi Univ Technol, Grad Sch Engn, 185 Miyanokuchi, Kochi, Japan

[2] Kochi Univ Technol, Intelligent Mech Syst Engn Course, 185 Miyanokuchi, Kochi 7828502, Japan

[3] Kochi Univ Technol, Ctr Nanotechnol, Res Inst, 185 Miyanokuchi, Kochi 7828502, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2019年 / 58卷 / 03期

关键词：

EQUILIBRIUM;

D O I：

10.7567/1347-4065/aafd18

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In equilibrium reaction processes, the precise control of composition ratios in multi-component thin films is problematic due to the changes in the state of precursor materials, which are caused by differences in metal ion stabilities. We have identified a strategy to resolve this problem by first developing a theory and then constructing a fine-channel type mist chemical vapor deposition (mist-CVD) system with two solution chambers and a mist-mixing chamber. Zn1-xMgxO thin films were fabricated using the conventional and the developed mist-CVD systems to verify the theory. The properties of the Zn1-xMgxO thin films produced using the two systems were significantly different. The Mg composition ratio in the film was clearly influenced by the Mg ion stability and all the measurement results support the theory. (C) 2019 The Japan Society of Applied Physics

引用

页数：9

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