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First-Order Piezoresistive Coefficients of Lateral NMOS FETs on 4H Silicon Carbide (vol 19, pg 6037, 2019)
被引:2
|作者:
Jaeger, Richard C.
[1
]
Chen, Jun
[1
]
Suhling, Jeffrey C.
[1
]
Fursin, Leonid
[2
]
机构:
[1] Auburn Univ, Auburn, AL 36849 USA
[2] United Silicon Carbide Inc, Monmouth Jct, NJ 08852 USA
关键词:
Piezoresistance;
Temperature measurement;
Voltage measurement;
MOS devices;
Stress;
Temperature sensors;
D O I:
10.1109/JSEN.2020.2982630
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We recently realized that the basic piezoresistivity matrix for 4H-SiC in the above paper [1] was not correct [2], [3]. The matrix and subsequent results are corrected here, and the section and equation numbers utilized here correspond to those in the original paper [1].
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页码:8186 / 8187
页数:2
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