First-Order Piezoresistive Coefficients of Lateral NMOS FETs on 4H Silicon Carbide (vol 19, pg 6037, 2019)

被引:2
|
作者
Jaeger, Richard C. [1 ]
Chen, Jun [1 ]
Suhling, Jeffrey C. [1 ]
Fursin, Leonid [2 ]
机构
[1] Auburn Univ, Auburn, AL 36849 USA
[2] United Silicon Carbide Inc, Monmouth Jct, NJ 08852 USA
关键词
Piezoresistance; Temperature measurement; Voltage measurement; MOS devices; Stress; Temperature sensors;
D O I
10.1109/JSEN.2020.2982630
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We recently realized that the basic piezoresistivity matrix for 4H-SiC in the above paper [1] was not correct [2], [3]. The matrix and subsequent results are corrected here, and the section and equation numbers utilized here correspond to those in the original paper [1].
引用
收藏
页码:8186 / 8187
页数:2
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  • [1] First-Order Piezoresistive Coefficients of Lateral NMOS FETs on 4H Silicon Carbide
    Jaeger, Richard C.
    Chen, Jun
    Suhling, Jeffrey C.
    Fursin, Leonid
    IEEE SENSORS JOURNAL, 2019, 19 (15) : 6037 - 6045