Nonlinearity measurement of thin metal films

被引：1

作者：

Vávra, R ^{[1
]}

Mach, P ^{[1
]}

机构：

[1] Czech Tech Univ, Fac Elect Engn, Dept Electrotechnol, Prague 16627, Czech Republic

来源：

24TH INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY: CONCURRENT ENGINEERING IN ELECTRONIC PACKAGING, CONFERENCE PROCEEDINGS | 2001年

关键词：

D O I：

10.1109/ISSE.2001.931056

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Investigation of nonlinearity of thin metal films, which have been manufactured by sputtering under various conditions in Ar, is the goal of this paper. The measurement of nonlinearity by CLT1 equipment (Radiometer, Copenhagen) is described in detail and the measurement by the use of a new measuring method, which is based on inter-modulating distortion, is presented, too. Measured values of nonlinearity of Ni, Al and Al-Si thin films are presented at the end of this paper.

引用

页码：202 / 206

页数：5