Overview: Recent progress in three-dimensional atom probe instruments and applications

被引：54
作者：
Cerezo, Alfred
Clifton, Peter H.
Lozano-Perez, Sergio
Panayi, Peter
Sha, Gang
Smith, George D. W.
机构：
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[2] Imago Scie Instruments, Oxford NanoSci Div, Milton Keynes MK11 3ER, Bucks, England
来源：
MICROSCOPY AND MICROANALYSIS | 2007年 / 13卷 / 06期
关键词：
atom probe; tomography; semiconductors; laser pulsing; specimen preparation; grain boundary; steels;
D O I：
10.1017/S143192760707095X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Over the last few years there have been significant developments in the field of three-dimensional atom probe (3DAP) analysis. This article reviews some of the technical compromises that have led to different instrument designs and the recent improvements in performance. An instrument has now been developed, based around a novel reflectron configuration combining both energy compensation and focusing elements, that yields a large field of view and very high mass resolution. The use of laser pulsing in the 3DAP, together with developments in specimen preparation methods using a focused ion-beam instrument, have led to a significant widening in the range of materials science problems that can be addressed with the 3DAP. Recent studies of semiconductor materials and devices are described.
引用
收藏
页码：408 / 417
页数：10
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