Defects reduction in a-plane AlGaN epi-layers grown on r-plane sapphire substrates by metal organic chemical vapor deposition

被引:36
作者
Zhao, Jianguo [1 ]
Zhang, Xiong [1 ]
Dai, Qian [1 ]
Wang, Nan [1 ]
Wu, Zili [1 ]
Wang, Shuchang [2 ]
Cui, Yiping [1 ]
机构
[1] Southeast Univ, Adv Photon Ctr, Nanjing 210096, Jiangsu, Peoples R China
[2] Changshu Inst Technol, Coll Phys & Elect Engn, Changshu 215500, Jiangsu, Peoples R China
关键词
PHASE EPITAXY; GAN GROWTH; NITRIDE; OVERGROWTH; FILMS;
D O I
10.7567/APEX.10.011002
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nonpolar a-plane AlGaN epi-layers were grown on a semi-polar r-plane sapphire substrate with an innovative two-way pulsed-flows metal organic chemical vapor deposition growth technology. A root-mean-square value of 1.79nm was achieved, and the relative light transmittance of the a-plane AlGaN epi-layer was enhanced by 36.9%. These results reveal that the innovative growth method is able to improve the surface morphology and reduce the defect density in nonpolar a-plane AlxGa1-xN epi-layers, particularly those with an Al composition greater than 0.5, which are key materials for the fabrication of nonpolar AlGaN-based high light emission efficiency deep-ultraviolet light-emitting diodes. (C) 2017 The Japan Society of Applied Physics
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页数:4
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