Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering

被引：12
作者：
Ito, Yoshiyasu
Inaba, Katsuhiko
Omote, Kazuhiko
Wada, Yasuo
Ikeda, Susumu
机构：
[1] Rigaku Corp, Technol & Prod Dev Div, Tokyo 1968666, Japan
[2] Toyo Univ, Grad Sch Interdisciplinary New Sci, Kawagoe, Saitama 3508585, Japan
[3] Univ Tokyo, Dept Complex Sci & Engn, Grad Sch Frontier Sci, Chiba 2778561, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2007年 / 46卷 / 29-32期
关键词：
small-angle X-ray scattering; grazing incidence; electron beam lithography; periodic groove; critical dimension; graphoepitaxial growth;
D O I：
10.1143/JJAP.46.L773
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A grazing incidence ultra-small-angle X-ray scattering measurement system using a laboratory X-ray source has been developed. Submicron-scale artificial periodic grooves on thermally oxidized silicon wafers are characterized using this system. They are fabricated by electron beam lithography. The average pitch widths of the grooves are determined accurately with a low standard uncertainty of less than 0.02%. The cross-sectional profiles are also analyzed by intensity ratios of higher-order diffraction peaks from the periodic structures and X-ray reflectivity measurements. The obtained cross-sectional profiles are in good agreement with those obtained by atomic force microscopy.
引用
收藏
页码：L773 / L775
页数：3
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